position

Coating composition, a film containing the same, and a method for forming a sealable film

A coating composition comprising: an aqueous dispersion comprising: the melt-kneading product of (A) a base polymer which comprises one or more thermoplastic polymers, (B) a stabilizing agent which comprises at least one component selected from the group consisting of acrylic acid grafted ethylene-based polymers and maleic anhydride grafted polyolefins; (C) a neutralizing agent; and (D) water; wherein the aqueous dispersion has a volume average particle size of less than about 5 μm is provided.




position

Atomic layer deposition of metal sulfide thin films using non-halogenated precursors

A method for preparing a metal sulfide thin film using ALD and structures incorporating the metal sulfide thin film. The method includes providing an ALD reactor, a substrate, a first precursor comprising a metal and a second precursor comprising a sulfur compound. The first and the second precursors are reacted in the ALD precursor to form a metal sulfide thin film on the substrate. In a particular embodiment, the metal compound comprises Bis(N,N'-di-sec-butylacetamidinato)dicopper(I) and the sulfur compound comprises hydrogen sulfide (H2S) to prepare a Cu2S film. The resulting metal sulfide thin film may be used in among other devices, photovoltaic devices, including interdigitated photovoltaic devices that may use relatively abundant materials for electrical energy production.




position

Low temperature silicon carbide deposition process

Methods for formation of silicon carbide on substrate are provided. Atomic layer deposition methods of forming silicon carbide are described in which a first reactant gas of the formula SinHaXb wherein n=1-5, a+b=2n+2, a>0, and X=F, Cl, Br, I; and a second reactant gas of the formula MR3-bYb, wherein R is a hydrocarbon containing substituent, Y is a halide, hydride or other ligand and b=1-3 are sequentially deposited on a substrate and then exposed to a plasma. The process can be repeated multiple times to deposit a plurality of silicon carbide layers.




position

Multiple position foot massaging device

A foot massaging device having a plurality of parallel cylindrical rollers mounted within a frame. The frame includes adjustment slots allowing the rollers to be relocated within the frame to present various massaging configurations. The foot massaging device is adjustable by seating the rearwardly disposed rollers between a raised and lowered position to configure the rollers to contact different portions of a user's foot.




position

Systems, devices, and methods for directly energizing water molecule composition

Systems, devices, and methods for generating energized water molecules and administering same to a human or other biological subject. The system includes a humidifying apparatus, and excitation apparatus, and a control system. The system may further include a fluid management system to assist in the delivery of energized water molecules.




position

Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).




position

Chemically amplified positive photoresist composition

A photoresist composition. The composition has the following: (a) one or more resin binders that include one or more acid sensitive groups and that are substantially free of phenolic groups protected by acetal or ketal groups; (b) one or more photo acid generators, that, upon exposure to a source of high energy, decompose and generate a photoacid strong enough to remove the one or more acid sensitive groups; (c) one or more ionic non-photosensitive additives including an iminium salt; and (d) one or more solvents. There is also a process for patterning relief structures on a substrate employing the photoresist composition.




position

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.




position

Negative resist composition and pattern forming method using the same

A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.




position

Photosensitive composition comprising an acrylate compound

The present invention relates to a photosensitive composition including an acrylate-based compound having an adamantyl structure. It is possible to manufacture an organic thin film that is easily stripped without decreasing the strength of the thin film by using the photosensitive composition.




position

Resin composition for forming optical waveguide and optical waveguide using the composition

A resin composition for forming an optical waveguide brings together excellent bending resistance, a low refractive index, and low tackiness suitable for a roll-to-roll (R-to-R) process as a material for forming an optical waveguide, in particular, a material for forming a clad layer. The resin composition for forming an optical waveguide to be used in formation of an optical waveguide includes a polyvinyl acetal compound having a structural unit represented by the following general formula (1) as a main component: in the formula (1), R represents an alkyl group having 1 to 3 carbon atoms, and k, m, and n represent ratios of respective repeating units in a main chain and each represent an integer of 1 or more.




position

Liquid deposition photolithography

Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.




position

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film

Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.




position

Solution of gallium phthalocyanine method for preparing the same method for producing gallium phthalocyanine crystal method for purifying composition containing gallium phthalocyanine and method for producing electrophotographic photosensitive member

A solution of a gallium phthalocyanine contains a compound of formula (1) and a gallium phthalocyanine of formula (2), H2N—CH2—R1—CH2—NH2 (1) wherein R1 represents a single bond, or a substituted or unsubstituted alkylene group having 1 to 10 main-chain carbon atoms, a substituent of the substituted alkylene group is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, or a hydroxy group, one of the carbon atoms in the main chain of the alkylene group may be replaced with an oxygen atom, a sulfur atom, or a bivalent group represented by the formula —NR2—, and R2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, and wherein X1 represents a chlorine atom or hydroxy group.




position

Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).




position

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.




position

Polymerizable tertiary ester compound, polymer, resist composition, and patterning process

The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.




position

Resist composition, patterning process and polymer

An additive polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OR2)—R3 group (wherein R2 is H, acyl or acid labile group, R3 is H, CH3 or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.




position

Resist composition, method of forming resist pattern and compound

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.




position

Developable bottom antireflective coating composition and pattern forming method using thereof

The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.




position

Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer film

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.




position

Transmitter position integrity checking

The subject matter disclosed herein relates to determining whether a reported position of a wireless transmitter is sufficiently accurate in accordance with an accuracy metric based at least in part on a calculated range between an estimated position of a mobile station and the reported position and also based at least in part on one or more measurements taken from one or more signals transmitted by the wireless transmitter.




position

Apparatus for adjusting a position of a bicycle derailleur

A bicycle transmission control apparatus comprises a control unit that provides a first signal to operate a first derailleur a gear shift distance from a first origin sprocket to a first destination sprocket. The control unit receives a condition signal that indicates a condition resulting from at least one of the first derailleur and a second derailleur; and an adjustment controller moves the first derailleur an adjustment distance less than the gear shift distance in response to the condition signal.




position

Device and method for depositing a powder mixture for forming an object with composition gradients

A device for depositing a mixture of powders to form an object with composition gradients, including: a plurality of tanks respectively configured to contain different powders; a powder mixer placed under the tanks and including a rotatably mounted mixing member; a plurality of powder dispensing mechanisms respectively cooperating with the tanks, and each configured to regulate mass flow rate of the powder escaping from a respective of the tanks towards the mixer; a powder mixture collector placed under the mixer; and a powder mixture dispenser placed under the collector.




position

Compositions of protein receptor tyrosine kinase inhibitors

The present invention relates to novel synthetic substituted heterocyclic compounds and pharmaceutical compositions containing the same that are capable of inhibiting or antagonizing a family of receptor tyrosine kinases, Tropomysosin Related Kinases (Trk), in particular the nerve growth factor (NGF) receptor, TrkA. The invention further concerns the use of such compounds in the treatment and/or prevention of pain, cancer, restenosis, atherosclerosis, psoriasis, thrombosis, or a disease, disorder or injury relating to dysmyelination or demyelination or the disease or disorder associated with abnormal activities of NGF receptor TrkA.




position

Chlorobis copper (I) complex compositions and methods of manufacture and use

A method of manufacturing an anhydrous copper complex of formula C12H10CICuN2O4 and methods of treating neuromuscular and other diseases, including but not limited to fibromyalgia, multiple sclerosis, muscular dystrophy, rheumatoid arthritis, pain, fatigue, sleeplessness, loss of fine motor control, speech loss, inflexibility, Alzheimer's, dementia, amyotrophic lateral sclerosis, depression, lyme disease, lyme disease co-infection, gastroparesis (GP), myopathy, chronic inflammation and/or incontinence. The anhydrous copper complex preferably is administered in a pharmaceutical and/or dietary supplement composition of the invention.




position

BAX agonist, compositions, and methods related thereto

The disclosure relates to BAX activators and therapeutic uses relates thereto. In certain embodiments, the disclosure relates to methods of treating or preventing cancer, such as lung cancer, comprising administering a therapeutically effective amount of a pharmaceutical composition comprising a compound disclosed herein or pharmaceutically acceptable salt to a subject in need thereof.




position

Continuously variable transmission oil composition

A continuously variable transmission oil composition comprising a base oil and at least one phosphorous compound in such an amount that the phosphorus in the phosphorus compound accounts for 0.005 to 0.15 mass % of the total mass of the composition and wherein the continuously variable transmission oil composition has a friction coefficient from 0.146 to 0.164 when tested according to ASTM D2714.




position

Lubricating oil composition for working using sizing press

Provided is a lubricating oil composition for sizing which is excellent in machinability and degreasing efficiency and which is excellent in compatibility with an impregnating oil and a sintered metal of oil impregnated bearings. A lubricating oil composition for sizing, including (A) a lubricating base oil having a kinematic viscosity of 0.5 to 100 mm2/s at 40° C. and compounded therein (B) an extreme-pressure agent in an amount of 0.1 to 10% by mass, and (C) a metal deactivator in an amount of 0.01 to 5% by mass, each based on a total amount of the composition.




position

Additives and lubricating oil compositions containing same

Para-alkylated substituted diphenylamines are made by catalytically alkylating diphenylamine with a branched-chain alkene, such as propene, oligomer mixture in which the oligomer present in the greatest percentage has 15-24 carbon atoms. The alkylated diphenylamines are useful crankcase lubricant additives such as for reducing piston deposits and engine sludge.




position

Lubricant oil composition and method for making the same

The lubricating oil composition of the invention comprises a lubricating base oil with a kinematic viscosity at 100° C. of 1-20 mm2/s, and a viscosity index improver having a ratio M1/M2 of 0.20 or greater, between the total area of the peaks between chemical shifts of 36-38 ppm M1 and the total area of the peaks between chemical shifts of 64-66 ppm M2, with respect to the total area of all of the peaks, in the spectrum obtained by 13C-NMR. The lubricating oil composition of the invention has excellent effects, with a sufficiently high HTHS viscosity at 150° C., and a sufficiently low kinematic viscosity at 40° C., a sufficiently low kinematic viscosity at 100° C. and a sufficiently low HTHS viscosity at 100° C.




position

Ethylene based copolymer compositions as viscosity modifiers and methods for making them

Polymeric compositions and methods for making and using the same are provided. The polymeric composition can include a first ethylene-based copolymer and a second ethylene-based copolymer. The first ethylene-based copolymer can have a weight percent of ethylene-derived units based on a weight of the polymeric composition (EA) ranging from about 35 wt % to about 52 wt % and a weight-average molecular weight (MwA) of less than or equal to 130,000. The second ethylene-based copolymer can have a weight percent of ethylene-derived units based on the weight of the polymeric composition (EB) ranging from about 65 wt % to about 85 wt % and a weight-average molecular weight (MwB) of less than 130,000.




position

Refrigerating machine oil and working fluid composition for refrigerating machines

The refrigerating machine oil of the invention includes an ester of a polyhydric alcohol and a fatty acid, wherein the molar ratio of C4-C6 fatty acid and C7-C9 branched fatty acid in the fatty acid is between 15:85 and 90:10, the C4-C6 fatty acid includes 2-methylpropanoic acid, and the ratio of the total C4-C6 fatty acid and C7-C9 branched fatty acid in the total fatty acids composing the ester is at least 20 mol %. The working fluid composition for a refrigerating machine according to the invention comprises the refrigerating machine oil, a difluoromethane refrigerant and/or an unsaturated fluorinated hydrocarbon refrigerant.




position

Star polymer lubricating composition

The invention provides a lubricating composition containing (a) 0.001 wt % to 15 wt % of a polymer with radial or star architecture; (b) an overbased detergent; (c) a dispersant; and (d) an oil of lubricating viscosity. The invention further provides a method for lubricating a mechanical device with the lubricating composition.




position

Lubricating oil compositions containing epoxide antiwear agents

A lubricating oil composition comprising (a) a major amount of an oil of lubricating viscosity; and (b) an oil soluble epoxide compound having the following structure: wherein X is hydrogen or a substituted or unsubstituted C1 to C20 hydrocarbyl group, wherein the substituted hydrocarbyl group is substituted with one or more substituents selected from hydroxyl, alkoxy, ester or amino groups and Y is —CH2OR, —C(═O)OR1 or —C(═O)NHR2, wherein R, R1 and R2 are independently hydrogen or C1 to C20 alkyl or alkenyl groups; and further wherein the oil of lubricating viscosity does not contain a carboxylic acid ester.




position

Polymeric compositions useful as rheology modifiers and methods for making such compositions

Disclosed are rheology modifiers comprising compositionally disperse polymeric compositions and/or crystallinity disperse polymeric compositions that may be useful in modifying the rheological properties of lubrication fluids, and methods for making such compositions. The compositionally disperse polymeric composition are formed from at least two discrete compositions of ethylene copolymers. The crystallinity disperse polymeric composition are formed from ethylene copolymers having at least two discrete values of residual crystallinity.




position

Lubricant base oil, lubricant composition for internal combustion engine and lubricant composition for driving force transmitting device

The lubricating base oil of the invention is characterized by satisfying at least one of the following conditions (a) or (b). (a) A saturated compound content of 95% by mass or greater, and a proportion of 0.1-10% by mass of cyclic saturated compounds among the saturated compounds.(b) The condition represented by the following formula (1). 1.435≦n20−0.002×kv100≦1.450 (1) wherein n20 represents the refractive index of the lubricating base oil at 20° C., and kv100 represents the kinematic viscosity (mm2/s) of the lubricating base oil at 100° C.




position

Lubricant composition using ionic liquid as a base oil and having excellent rust prevention properties

The invention provides a lubricant composition containing (A) an ionic liquid having an anion represented by formula 1: (Rf1-SO2) (Rf2-SO2) N− or formula 2: (Rf3) (Rf3) (Rf3) PF3− wherein Rf1 and Rf2 in formula 1 may be the same or different and are each F, CF3, C2F5, C3F7 or C4F9, and Rf3 in formula 2 may be the same or different and is CF3, C2F5, C3F7 or C4F9; and (B) a fatty acid amine salt in an amount of 0.1 to 5.0 mass %. The lubricant composition of the invention can favorably be used under a high vacuum or an ultra high vacuum, or under high temperatures, and exhibits excellent rust prevention properties.




position

Lubricating oil composition

An internal-combustion engine lubricating oil composition has a P content of not greater than 0.09 mass %; a S content of not greater than 0.3 mass %; and a sulphated ash content of not greater than 1 mass %. It contains the following additives: as sole ashless, nitrogen-containing dispersant, and providing from 0.03 to 0.07 mass % of nitrogen in the lubricating oil composition, at least one ashless, nitrogen-containing derivative of a polyalkenyl-substituted mono- or dicarboxylic acid, anhydride or ester, the polyalkenyl-substituted mono- or dicarboxylic acid, anhydride or ester being made from a polyalkene exclusively by the thermal “ene” reaction; as sole overbased metal detergent, at least one overbased alkaline earth metal sulfonate; and at least one viscosity modifier.




position

Molybdenum dialkyldithiocarbamate compositions and lubricating compositions containing the same

A novel molybdenum dithiocarbamate composition is produced by preparing a di-tridecylamine (DTDA) intermediate from a butylene feedstock comprising greater than 50% 2-butylene, and preparing a molybdenum dithiocarbamate composition from the DTDA intermediate. The resulting molybdenum dithiocarbamate composition are according to formula (1), wherein R1 to R4 are C11-C14 isoalkyl groups, and X represents oxygen and/or sulfur atoms, and R1 to R4 comprise, on average, greater than 98% C13:




position

Grease composition for hub unit bearing employing an angular contact ball bearing and hub unit bearing

The invention provides a grease composition for a hub unit bearing employing an angular contact ball bearing, containing (a) as a thickener a mixture of diurea compounds represented by formula (I): R1—NHCONH—R2—NHCONH—R1, formula (II): R1—NHCONH—R2—NHCONH—R3, and formula (III): R3—NHCONH—R2—NHCONH—R3 wherein R1 is cyclohexyl group, R2 is a divalent aromatic hydrocarbon group having 6 to 15 carbon atoms, R3 is a straight-chain or branched alkyl group having 12 to 20 carbon atoms, and (R1/(R1+R3))×100=85 to 95 mol %; (b) a base oil; (c) a molybdenum dialkyldithiocarbamate; and (d) a calcium sulfonate. The grease composition of the invention, when used in the hub unit bearing, shows minimum leakage, excellent anti-flaking properties and satisfactory bearing lubrication life.




position

Method and system for screening lubricating oil compositions

A method for screening a lubricating oil composition having at least one base oil of lubricating viscosity and at least one lubricating oil additive is provided, the method comprising the steps of (a) inputting into a computational device an amount of each of the at least one lubricating oil additive, based on the total weight of the lubricating oil composition and, optionally, a value of at least one property associated with each of the at least one base oil of lubricating viscosity; (b) computing a prediction of at least one lubricating oil composition property-determining test result for the lubricating oil composition; (c) computing a cost for the lubricating oil composition; and (d) outputting the results. Also provided are systems and computer program devices for screening lubricating oil compositions.




position

Nanoparticle-containing lubricating oil compositions

[Object] To provide a nanoparticle-containing lubricating oil composition which demonstrates a low friction coefficient and realizes a further fuel economy. [Solving Means] A nanoparticle-containing lubricating oil composition comprising a base oil, an additive having hydroxyl group, and nanoparticle. A nanoparticle-containing lubricating oil composition comprising a base oil, an ashless friction modifier having hydroxyl group, and nanoparticle. A nanoparticle-containing lubricating oil composition comprising a base oil, an additive having hydroxyl group, and nanoparticle having a particle diameter of 1 to 100 nm. A nanoparticle-containing lubricating oil composition comprising a base oil, an ashless friction modifier having hydroxyl group, and nanoparticle having a particle diameter of 1 to 100 nm.




position

Lubricating oil composition

A lubricating oil composition comprising a Group II basestock and a neutral or overbased metal hydrocarbyl-substituted hydroxybenzoate detergent having a basicity index of less than 2.




position

Lubricant oil composition

A lubricant oil composition according to the present invention comprises: a lubricant base oil whose kinematic viscosity at 100° C. is 1 to 20 mm2/s; and a viscosity index improver in which a ratio M1a/M2a of a total area M1a of peaks in a chemical shift between 29-31 ppm to a total area M2a of peaks in a chemical shift between 64-69 ppm based on a total area of all the peaks is not less than 10 in a spectrum obtained by 13C-NMR.




position

Lubricating oil additive composition and method of making the same

An oil-soluble lubricating oil additive composition comprising (a) at least 3.5 wt-% of at least one friction modifier selected from the group consisting of fatty acids, fatty acid amides, fatty acid esters, and alkane diols which have a melting point of greater than 30° C.; (b) at least 10 wt-% actives dispersant; and (c) a sufficient amount of surfactant to make said additive composition haze-, sediment-, and skin-free, provided that said additive composition contains at least 150 mm surfactant per kg of said lubricating oil additive composition.




position

Lubricant composition and continuously variable transmission

Provided is a lubricating oil composition containing a base oil which includes a mineral oil and/or a synthetic oil, and compounded therein, (A) at least one phosphorus-containing compound selected from phosphoric acid monoesters, phosphoric acid diesters and phosphorous acid monoesters, each having a C1 to C8 hydrocarbon group or groups and (B) a tertiary amine compound having C6 to C10 hydrocarbon groups as substituents thereof. The lubricating oil composition provides both a high metal to metal friction coefficient and an excellent wear resistance and is suitably used in a continuously variable transmission.




position

Thickened grease composition

A thickened grease composition is provided by process of heating a mineral oil and 12-hydroxystearic acid with lithium hydroxide and forming a simple lithium grease to which at least one component selected from the group comprising succinic acid, glutaric acid, adipic acid, 6-hydroxycaproic acid, dimethyl succinate, dimethyl glutarate, dimethyl adipate, methyl hydroxycaproate, cyclohexanediols, methyl 5-hydroxyvalerate, methyl valerate, gamma butyrolactone, and methyl levulinate or mixtures thereof.




position

Antiwear composition and method of lubricating driveline device

The present invention relates to a method of driveline device by supplying to the driveline device a lubricating composition containing an oil of lubricating viscosity and an antiwear package, wherein the antiwear package includes: (a) derivatives of a carboxylic acid (typically a hydroxycarboxylic acid); and (b) a phosphorus compound. The invention further provides lubricating compositions containing an oil of lubricating viscosity and an antiwear package, wherein the antiwear package includes (a) derivatives of a carboxylic acid (typically a hydroxycarboxylic acid); and (b) an amine or metal salt of a phosphorus compound that is either (i) a hydroxy-substituted di-ester of (thio)phosphoric acid, or (ii) a phosphorylated hydroxy-substituted di- or tri-ester of (thio)phosphoric acid.




position

Lubricating oil composition for sliding section comprising aluminum material, and lubricating method

Provided are a lubricant composition capable of reducing friction between sliding parts at least one of which contains an aluminum-based material in a lubrication section, and a method for lubricating an aluminum-based member with the composition. The lubricant composition is for use in a lubrication section having sliding parts at least one of which contains an aluminum-based material, and contains a lubricant base oil and at least one of a phosphorus-containing carboxylic compound and a metal salt thereof (component (A)) at 0.001 to 1 mass % of the composition in terms of phosphorus. The composition may suitably be used as lubricant such as drive train lubricant for automatic or manual transmissions, grease, wet brake oil, hydraulic actuation oil, turbine oil, compressor oil, bearing oil, refrigerant oil, and the like used in apparatus having the sliding parts.