In a device for machining, in particular etching and/or developing, substrates, in particular wafers, in particular etching and/or developing, having a turntable, the turntable has a Venturi gap.

Graphite and/or carbon surfaces are coated with a titanium nitride coating by exposing the substrate to electric arc thermal spray process wherein titanium wire as the source of titanium and nitrogen is used as the propelling (atomizing) gas.

The present invention describes a hair treatment application system, comprising at least one or more hair treatment compositions (15) having a viscosity of from 3,000 cPs to 150,000 cPs and a hair treatment application device (1) comprising a first plate (10) and a second plate (20) positionable in a juxtaposed relationship when said hair treatment application device (1) is in a closed state. The hair treatment application device (1) is characterized by having a first zone comprising at least one absorbent substrate (40) on the internal surface (101) of said at least said first plates (10) and a second zone (50) on said internal surface (101) which is free of said absorbent substrate (40). Said at least one absorbent substrate (40) has a median pore radius of from 300 microns to 3,000 micron. The present invention describes also methods of treating the hair with said hair treatment application system (10) and kit comprising said hair treatment application system.

Provided are silica-based fine particle dispersion sols, processes for producing the sols, coating compositions containing the dispersion sol, curable coating films obtained from the coating composition, and substrates having the coating film. A process includes (1) mixing an aqueous aluminate solution to an alkaline silica sol which contains water-dispersible silica fine particles in a given ratio; (2) heating the mixture liquid obtained in the step (1) to 60 to 200° C. and stirring the mixture liquid at the temperature for 0.5 to 20 hours; and (3) contacting the mixture liquid obtained in the step (2) with a cation exchange resin to remove by ion exchange alkali metal ions contained in the mixture liquid and thereby controlling the pH of the mixture liquid to be in the range of 3.0 to 6.0.

A flexible display device including: a flexible substrate having a display area and a moisture absorption area at a surface; a display unit at the display area; a moisture absorption layer at the moisture absorption area; and a sealant along an edge of the display area and configured to seal the moisture absorption layer and the display unit. The flexible substrate is configured to be folded at least one time, and the display area and the moisture absorption area are opposite to each other.

A drive system for a transport apparatus includes a plurality of permanent magnets connected to the transport apparatus, a plurality of stationary windings exposed to a field of at least one of the plurality of permanent magnets, a control system for energizing the stationary windings to provide magnetic force on the transport apparatus, and an arrangement of ferromagnetic components proximate at least one side of the transport apparatus for providing passive stabilization of lift, pitch, and roll of the transport apparatus.

The present invention is realized by apparatus and methods for placing a large utility scale photovoltaic array in the low stratosphere of earth's atmosphere at an altitude of about 20 km, above clouds, moisture, dust, and wind. This is accomplished using a large light-weight, rigid, buoyant structure to support the large photovoltaic array. Long, strong and light tethers connect the buoyant structure to the ground and hold it in position against wind forces. The electricity output from the photovoltaic array is then coupled to high voltage transmission lines which connect from the platform to the earth's surface. The electricity is then transmitted through the high voltage transmission lines to the earth's surface where it is connected to the electrical supply grid and provides lower cost, more reliable electricity.

The present invention is realized by apparatus and methods for placing a large rigid buoyant platform in the low stratosphere of earth's atmosphere at an altitude of about 20 km, above clouds, moisture, dust, and wind. The platform can serve several uses, either individually or in any combination. These uses include uninterrupted radio and light communications, radar and optical observation including very powerful radars and solar power electricity generation. Long, strong and light tethers connect the buoyant structure to the ground which hold it in position against wind forces. The electricity output from a photovoltaic array is used to power platform uses and can also be coupled to high voltage transmission lines which transmit power from the platform to the earth's surface during daylight hours. Power can also be transmitted up to the platform during darkness to power facilities mounted on the platform ensuring continuous operation.

Proposed is a device for coating substrates by means of high-velocity flame spraying. The device comprises a combustion chamber (4), a first fuel feeder (L1) for feeding a liquid or gaseous fuel as well as at least one gas feeder for feeding an oxidative gas. The devise comprises furthermore a second fuel feeder (L5) for feeding a liquid or gaseous fuel as well as at least one further gas feeder for feeding a gas. Both the first gas feeder and the two fuel feeders (L1, L5) port into a common combustion chamber (4). In addition, means 24, 28 are provided for independent control of the fuel feed into the two fuel feeders (L1, L5).

An apparatus and method for coating a substrate using one or more liquid raw materials, includes: at least one atomizer for atomizing the one or more liquid raw materials into droplets, charging means for electrically charging the droplets during or after the atomization and a deposition chamber in which the droplets are deposited on the substrate, the deposition chamber being provided with one or more electric fields for guiding the electrically charged droplets on the substrate. According to the invention there is a charging chamber arranged upstream of the deposition chamber and provided with charging means for electrically charging the droplets.

A method for preparing a lenticular guide roll for use in a lenticular printing run. The method comprises providing a printing roll of a printing press and a first piece of lenticular media. The first piece of lenticular printing substrate has a pitch which is substantially identical to a second lenticular printing substrate to be used in the lenticular printing run. The, method further comprises attaching the first piece of lenticular printing substrate to the printing roll to allow the maneuvering of the second lenticular printing substrate by the printing roll in the printing press.

In one example, a device for use in a printer includes a flexible piece and a holder configured to removably attach the piece to a platen that has a surface over which a print substrate is moved through the print zone for printing on the substrate. The piece and the holder are configured to place the piece in tension along the platen surface such that, when the piece is attached to the platen, the piece becomes sufficiently rigid to counter substrate edge curl.

A contact printing system is disclosed. A gravure cylinder having a plurality of discrete cells having an aspect ratio of at least about 25:1 disposed upon an outer surface thereof. A first portion of a first fluid and a second portion of a second fluid are disposed from a respective channel disposed internal to the gravure cylinder.

A system and method of reducing the net carbon dioxide footprint of an industrial process that generates power from the combustion of hydrocarbon fuels in which ambient air is admixed with up to 50% by volume of an effluent gas from the power generator of the industrial process, in order to substantially increase the CO2 concentration in the air prior to treatment. The treatment comprises adsorbing CO2 from the admixed ambient air utilizing a cooled, porous substrate-supported amine adsorbent, wherein the porous substrate initially contacts the mixed ambient air containing condensed water in its pores, which act as an intrinsic coolant with respect to the exothermic heat generated by the adsorption process. In addition, prior to regenerating the supported adsorbent, air pressure is substantially reduced in the sealed regeneration chamber and the low pressure chamber is placed in fluid connection with a higher pressure regeneration chamber containing steam and carbon dioxide, to preheat the sorbent to be regenerated and to quickly cool the regenerated sorbent prior to use for further CO2 adsorption.

The invention relates to a device for the hydrolysis of preferably solid organic substrates, in particular of energy crops and plant residues, with a collection vessel (1) for receiving the organic substrates, with a conveying means (4) for transporting the organic substrates into a charging device (7) for the batch-wise charging of a hydrolyzer (10) with the organic substrates, the hydrolyzer (10) being provided on the output with a pressure-release device (12) having a valve-controlled pressure diaphragm (13) and a steam trap (14) arranged upstream of an expander tank (15). According to the invention, the conveying means (4) includes a conveyor worm (4') with a sleeve shaft (25), which is charged with hot steam from the steam trap (14), which is preferably designed as a cyclone, the sleeve shaft (25), in the conveying zone for the organic substrate, having, in a heating zone (18), steam-outlet openings (26) for directly charging the organic substrate with hot steam.

The present disclosure provides for a fibrous structure having an initial total wet tensile strength of greater than about 118 g/cm and at least one embossed ply having a surface thereof. The surface has a surface area comprising from about 10.0 percent to about 20.0 percent line embossments. Also, a fibrous structure having at least two plies is disclosed. One of the two plies has an initial total wet tensile strength of greater than about 118 g/cm and at least one embossed ply having a surface thereof. The surface has a surface area comprising from about 10.0 percent to about 20.0 percent line embossments.

A semiconductor substrate for use in an integrated circuit, the semiconductor substrate including a channel defined on a surface of the substrate. The channel includes a first wall, a second wall, and a third wall. The first wall is recessed from the surface. The second wall extends from the surface to the first wall. The third wall extends from the surface to the first wall and faces the second wall across the channel. At least one of the second wall and the third wall includes a plurality of structures projecting into the channel from the second wall or the third wall.

A metal laminated substrate for an oxide superconducting wire is manufactured such that a non-magnetic metal plate T1 having a thickness of not more than 0.2 mm and a metal foil T2 made of Cu alloy which is formed by cold rolling at a draft of not less than 90% and has a thickness of not more than 50 μm is laminated to each other by room-temperature surface active bonding, after lamination, crystal of the metal foil is oriented by heat treatment at a temperature of not less than 150° C. and not more than 1000° C. and, thereafter, an epitaxial growth film T3 made of Ni or an Ni alloy having a thickness of not more than 10 μm is laminated to the metal foil.

The present invention relates to methods and compositions for coating aluminum substrates. In an embodiment, the invention includes a method of applying a coating on an aluminum substrate including contacting the aluminum substrate with a first solution. The first solution can include a zinc metal salt, a sugar acid or alkali metal salt thereof, and an alkali metal hydroxide. The method can also include contacting the aluminum substrate with a second solution. The second solution can include a molybdate salt, an alkanolamine, and a fluorine acid. Other embodiments are also included herein.

A substrate processing apparatus that includes a process tank having a pair of opposed sidewalls for storing a chemical liquid, and processing a plurality of substrates by the chemical liquid; a substrate holding mechanism including a holding part for holding the plurality of substrates, and a back part connected to the holding part and interposed between the substrates held by the holding part and one sidewall of the pair of opposed sidewalls when the substrate holding mechanism is loaded into the process tank. A heating device is disposed on the process tank for heating the stored chemical liquid. The heating device includes at least a first heater disposed on the one sidewall, and a second heater disposed on the other sidewall of the pair of opposed sidewalls. Energy outputs of the first heater and the second heater are independently controlled.

Substrate treatment systems are provided. The substrate treatment systems may include a treating device configured to treat a substrate with a supercritical fluid, and a supplying device configured to supply the supercritical fluid to the treating device. The treating device may include a supercritical process zone in which the substrate is treated with the supercritical fluid, and a pre-supercritical process zone in which the supercritical fluid is expanded and then provided into the supercritical process zone to create a supercritical state in the supercritical process zone.

A nozzle of a nozzle device includes an arm pipe that extends in a horizontal direction and a downstream pipe formed so as to curve downward from one end of the arm pipe. In the nozzle, a metallic pipe is provided inside a second resin pipe. Moreover, a first resin pipe is provided inside the metallic pipe. A boss is attached to the tip of the metallic pipe between the first resin pipe and the second resin pipe. At the tip of the nozzle, an outer peripheral surface of the first resin pipe, an end surface of the second resin pipe and an end surface of the boss are welded by welding resin. In this way, the metallic pipe is reliably coated with the first resin pipe, the second resin pipe, the boss and the welding resin.

Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants from a substrate surface is provided which includes exposing a substrate to a peroxide clean solution, exposing the substrate to a hydroxide clean solution, and exposing the substrate to a selective etch solution containing potassium iodide, iodine, sulfuric acid, and water during a selective etch process. The substrate generally contains gallium arsenide material, such as crystalline gallium arsenide, and is usually a growth substrate for an epitaxial lift off (ELO) process. The copper or other metallic contaminants disposed on the substrate may be selectively etched at a rate of about 500 times, about 1,000 times, about 2,000 times, or about 4,000 times or greater than the gallium arsenide material.

A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate.

A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

A surgical tool assembly includes a pair of opposing jaws. Further, a viewing opening may be provided in at least one of the opposing jaws. The viewing opening may extend from an upper to a lower surface of the opposing jaw in which the viewing opening is provided. The viewing opening may include a material retainer provided proximate the lower surface of the opposing jaw in which the viewing opening is provided. The material retainer may include an inclined surface inclined towards a central axis of the viewing opening. A grasping insert may be molded onto a lower surface of the opposing jaw in which the viewing opening is provided and an elastomeric material of the grasping inserts may within the viewing opening, the material of the grasping inserts covering the inclined surface of the first material retainer.

A temporary adhesive for reversibly bonding a silicon wafer to a silicon support contains a crosslinkable organopolysiloxanes composition and a fatty acid or salt thereof or fatty acid ester as a release regulator having a density different from the crosslinkable organopolysiloxanes composition of at least 0.1 g/cm3, which upon parting of the wafer from the substrate, the adhesive remains substantially adhered to the substrate.

The present invention provides a method for bonding two substrates using a UV radiation curing-redox curing adhesive system having a shadow area and a transparent area, comprising: bonding the shadow area of the substrates using a redox curing adhesive system, and bonding the transparent area of the substrates using a liquid optically clear adhesive containing UV initiators.

Disclosed is a liquid processing apparatus capable of accurately determining a holding state of a substrate without being influenced by, for example, material or surface condition of a substrate. The liquid processing apparatus includes a substrate holding unit that holds a substrate, a camera that photographs a region where a peripheral edge portion of substrate is present when substrate is properly held by the substrate holding unit, and a control unit that determines a holding state of the substrate held by the substrate holding unit based on an image photographed by the camera.

Aspects of the present disclosure include a navigation system and computer-implemented methods for proactively re-routing vehicles based on an analysis of input component data obtained from the navigation-enabled devices. The navigation system scores the input component data to obtain a measure of frustration (e.g., a feeling of being upset or annoyed) of the user of the navigation-enabled device. The navigation system may provide a detour suggestion for display on the navigation-enabled device to persuade the user of the device to direct their vehicle to depart from its current location or route in an effort to remove the vehicle from traffic, and thereby reduce the frustration level of the user. The detour suggestion may include an alternative route to the original destination, or an alternative destination.

Aspects of the present disclosure include a navigation system and computer-implemented methods for detecting traffic disruption events based on an analysis of input component data obtained from navigation-enabled devices of vehicles near a particular location. Traffic disruption events are events such as accidents, construction road closures, police and speed traps, or road hazards that cause a decrease in the flow of traffic along a particular route and thus, added time delays for occupants of vehicles traveling along those routes. The navigation system scores the input component data associated with each vehicle and aggregates the scored input component data to obtain a frustration score associated with the vehicle. The navigation system may detect traffic disruption events based on a number of vehicles near a particular area having associated frustration scores above a certain threshold.

Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator.

Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing the pattern collapse or the occurrence of contamination. A substrate is held in a liquid bath while being immersed in a liquid, and the liquid bath is disposed in a processing space of a processing vessel. A processing of drying the substrate is performed by replacing the liquid in the liquid bath with a supercritical-state fluid. A predetermined mechanism moves liquid bath between a processing location in the processing case and a stand-by location outside the processing case. A heater installed in the processing case changes the fluid to a supercritical state or maintains the supercritical state while cooling mechanisms cool down the liquid bath moved to the stand-by location outside the processing vessel.

A substrate treatment system for treating substrates in a continuous process includes a system chamber delimited by chamber walls, having an entry lock and an exit lock, and also at least one substrate treatment device and a transportation device inside the system chamber. The transportation device has an arrangement of transportation rollers arranged one behind the other in the transportation direction, for vertical or horizontal transportation of substrates. The rotor of the drive device is arranged under the pressure conditions prevailing in the system chamber and the stator of the drive device is arranged outside the pressure conditions prevailing in the system chamber.

The present invention discloses a roller for conveying glass substrate. The roller includes a structure of roller body that is formed by assembling a plurality of roller components together in a disassembleable manner. An axle bore is formed in center of the roller. The present invention also discloses a roller axle assembly for conveying glass substrate, which includes a plurality of rollers and a roller axle. A distance is formed between adjacent ones of the rollers. Each of the plurality of rollers is individually disassembleable. The roller for conveying glass substrate and the roller axle assembly according to the present invention allows any one of the rollers that are mounted to a roller axle assembly to be disassembled individually thereby shortening the time period for replacing the glass substrate roller, increasing the utilization rate of the roller, and lowering down the device maintenance cost.

Method of applying phase transition substance to impart reduced ignition propensity to a smoking article comprising a tobacco column and a wrapper surrounding the tobacco column and having a porous structure with a base permeability. The method comprising forming a pattern of phase transition material on the wrapper such that, when subjected to the heat of the tobacco column burning firecone, the phase transition material at least partially fills the wrapper porous structure in the vicinity of the burning firecone to form an area on the wrapper having reduced permeability lower than that of the wrapper base permeability. The reduced permeability of the wrapper in the vicinity of the burning firecone imparts reduced ignition propensity such that there is insufficient air flow to sustain combustion of the firecone or insufficient air flow to sustain an intensity of the burning firecone necessary to ignite the substrate.

A touch drive circuit and a driving method therefor, an array substrate and a touch display apparatus relate to a field of display. The driving method includes: during touch scanning time period in one frame, by each of output control unit (2), receiving a touch enable signal, a common voltage signal and a touch scanning signal, and receiving an output signal of an shift register unit connected with the output control unit; and outputting, by each of the output control units, the touch scanning signal to a touch drive electrode connected with the touch control unit in a first time period according to the touch enable signal and the output signal of the shift register unit connected with the output control unit, wherein the first time period is scanning time allocated to the touch drive electrode in one frame of time.

One embodiment includes a method comprising the steps of providing a first dry catalyst coated gas diffusion media layer, depositing a wet first proton exchange membrane layer over the first catalyst coated gas diffusion media layer to form a first proton exchange membrane layer; providing a second dry catalyst coated gas diffusion media layer; contacting the second dry catalyst coated gas diffusion media layer with the first proton exchange membrane layer; and hot pressing together the first and second dry catalyst coated gas diffusion media layers with the wet proton exchange membrane layer therebetween.

Water-free compositions suitable for application as a surface size to a cellulosic substrate, and methods of applying the water-free compositions to the surface of a cellulosic substrate.

In one embodiment, a substrate processing apparatus includes a substrate retainer and a substrate rotator to retain and rotate a substrate, liquid feeders to supply a cleaning liquid, a rinse liquid and a first coating liquid to a first face of the substrate, a heater to heat the substrate from a second face of the substrate, and a controller to control processing of the substrate. The controller supplies the first coating liquid to the first face while rotating the substrate at a first number of revolution. The controller heats the substrate from the second face while rotating the substrate at a second number of revolution that is different from the first number of revolution after the first coating liquid is supplied, to evaporate a solvent from the first coating liquid to form a coating film containing a solute of the first coating liquid on the first face.

A low surface tension liquid is supplied from a low surface tension liquid supplying unit to a heated substrate to replace a processing liquid by the low surface tension liquid. The heating of the substrate is weakened and the low surface tension liquid is supplied from the low surface tension liquid supplying unit to the substrate, so that a liquid film of the low surface tension liquid is formed. The liquid film on the substrate is removed by strengthening the heating of the substrate without supplying the low surface tension liquid from the low surface tension liquid supplying unit to a central region of the substrate.

Systems and methods for the formation of nanostructures, including carbon-based nanostructures, are generally described. In certain embodiments, substrate configurations and associated methods are described.

There is provided a substrate processing apparatus including a first exhaust system which is connected to a first pump and a second pump of a type different from the first pump and is configured to exhaust the interior of a process chamber, a second exhaust system which is connected to the second pump and is configured to exhaust the interior of the process chamber and a control part configured to control the first exhaust system and the second exhaust system such that, when the processing gas is exhausted from the interior of the process chamber, the interior of the process chamber is first exhausted by the second exhaust system, and then an exhaust path is switched from the second exhaust system to the first exhaust system after an internal pressure of the process chamber reaches a predetermined pressure, to exhaust the process chamber by the first exhaust system.

In one embodiment, a method receives a query for data in a database system and calls a plurality of engines to analyze information for the query. A calculation graph is generated from at least a portion of the plurality of engines where each of the at least a portion of the plurality of engines add a node to the calculation graph based on analyzing of the information for the query. Then, the method executes the query by calling the nodes of the calculation graph. Each node uses metadata added to the node from a respective calculation engine to perform a calculation for the node. Then, a result of the query is output based on the respective calculations performed by the nodes.

A manufacturing method of a package substrate is provided. The method includes forming a first circuit layer on a carrier. A passive component is disposed on the first circuit layer and the carrier. A dielectric layer is formed on the carrier to embed the passive component and the first circuit layer in the dielectric layer. A second circuit layer is formed on the dielectric layer. The carrier is removed from the dielectric layer. A manufacturing method of a chip package is also provided.

A system for determining thickness variation values of a semiconductor substrate comprises a substrate vacuumed to a pedestal that defines a reference plane for measuring the substrate. A measurement probe assembly determines substrate CTV and BTV values, and defines a substrate slope angle. A thermal bonding assembly attaches a die to the substrate at a bonding angle congruent with the substrate slope angle. A plurality of substrates are measured using the same reference plane on the pedestal. Associated methods and processes are disclosed.

Package structures and methods are provided to integrate optoelectronic and CMOS devices using SOI semiconductor substrates for photonics applications. For example, a package structure includes an integrated circuit (IC) chip, and an optoelectronics device and interposer mounted to the IC chip. The IC chip includes a SOI substrate having a buried oxide layer, an active silicon layer disposed adjacent to the buried oxide layer, and a BEOL structure formed over the active silicon layer. An optical waveguide structure is patterned from the active silicon layer of the IC chip. The optoelectronics device is mounted on the buried oxide layer in alignment with a portion of the optical waveguide structure to enable direct or adiabatic coupling between the optoelectronics device and the optical waveguide structure. The interposer is bonded to the BEOL structure, and includes at least one substrate having conductive vias and wiring to provide electrical connections to the BEOL structure.

A method of manufacturing a thin film transistor is disclosed. The method of manufacturing the thin film transistor includes: manufacturing a substrate; forming an oxide semiconductor layer on the substrate; forming a pattern including an active layer through a patterning process; forming a source and drain metal layer on the active layer; and forming a pattern including a source electrode and a drain electrode through a patterning process, an opening being formed between the source electrode and the drain electrode at a position corresponding to a region of the active layer used as a channel, wherein the step of forming the pattern including the source electrode and the drain electrode through a patterning process includes: removing a portion of the source and drain metal layer corresponding to the position of the opening through dry etching. The method may also be used to manufacturing a thin film transistor.

A TFT and manufacturing method thereof, an array substrate and manufacturing method thereof, an X-ray detector and a display device are disclosed. The manufacturing method includes: forming a gate-insulating-layer thin film (3'), a semiconductor-layer thin film (4') and a passivation-shielding-layer thin film (5') successively; forming a pattern (5') that includes a passivation shielding layer through one patterning process, so that a portion, sheltered by the passivation shielding layer, of the semiconductor-layer thin film forms a pattern of an active layer (4a'); and performing an ion doping process to a portion, not sheltered by the passivation shielding layer, of the semiconductor-layer thin film to form a pattern comprising a source electrode (4c') and a drain electrode (4b'). The source electrode (4c') and the drain electrode (4b') are disposed on two sides of the active layer (4a') respectively and in a same layer as the active layer (4a'). The manufacturing method can reduce the number of patterning processes and improve the performance of the thin film transistor in the array substrate.

An array substrate of organic light-emitting diodes and a method for fabricating the same are provided to narrow an edge frame of product device of organic light-emitting diodes, to shorten the package process time, and to improve the substrate utilization and the production efficiency. The array substrate of organic light-emitting diodes includes a plurality of display panels disposed in an array of rows and columns, wherein at least two adjacent display panels are connected through a frame adhesive, and there is no cutting headroom between at least one side of the at least two adjacent display panels.