A remotely actuated pilot gas valve includes safe lighting and complete shutoff capabilities in the event that the flame that is heating a thermocouple is extinguished. The invention provides for a heater system that utilizes such a pilot gas valve as well as a method whereby the pilot gas valve used in such a system can be remotely and electronically actuated when required. Remote actuation is accomplished by use of a solenoid that is incorporated within the valve design and which is controlled by a remote operator.

An exemplary embodiment provides a regenerative burner apparatus. The apparatus includes a burner housing having a gas channel and a single-stage heat regenerator equipped with a housing enclosing a fluid-porous heat regenerative media bed. A first gas passageway in the housing directly interconnects the gas channel and the lower surface of the media bed. A second gas passageway in the housing interconnects an opening in the housing communicating with the exterior and the upper surface of the media bed. This arrangement allows hot waste combustion gases to pass upwardly through the media bed so that any condensable contaminant in the gases condenses to a liquid and flows out of the bed under gravity before becoming solid and clogging the bed. The liquid contaminant may then be removed from the regenerator from a position below the media bed.

A service method of gas appliances includes: Detecting the gas appliances at the client ends to generate detecting signals. Transmitting the detecting signals to a service end. Identifying which client end the detecting signals come from. Examining the detecting signals to find whether the gas appliance has an abnormal condition; and informing the client end when the abnormal condition is found. After all, the service end may monitor the gas appliances at the client end, and inform the client for repair when the gas appliance has detected an abnormal signal or has damaged parts.

A combustion chamber is provided and includes a combustion device and a supply circuit arranged to feed fuel at a plurality of locations of the combustion device. The supply circuit includes manifolds collecting fuel to be distributed among at least some of the locations, ducts extending from the manifolds and feeding the locations. Some of the ducts carry valves having a plurality of predetermined working positions, each working position corresponding to a different fuel flow through the valve.

In a gas turbine engine that includes a compressor and a combustor, wherein the combustor includes a primary fuel injector within a fuel nozzle and a secondary fuel injector that is upstream of the fuel nozzle and configured to inject fuel into a flow annulus of the combustor, a method for detecting a flame holding condition about a fuel injector. The method may include the steps of: detecting an upstream pressure upstream of the secondary fuel injector; detecting a downstream pressure downstream of the secondary fuel injector; determining a measured pressure difference between the upstream pressure and the downstream pressure; and comparing the measured pressure difference to an expected pressure difference.

A method and system for improving high excess air combustion system efficiency, including induration furnaces, using a re-routing of flue gas within the system by gas recirculation. Flue gas is drawn from hot system zones including zones near the stack, for re-introduction into the process whereby the heat recovery partially replaces fuel input. At least one pre-combustion drying zone, at least one combustion zone, and at least a first cooling zone exist in these furnaces. At least one exhaust gas outlet is provided to each pre-combustion drying and combustion zone. At least part of the gaseous flow from each system zone exhaust outlet is selectively delivered to an overall system exhaust, the remaining flow being selectively delivered via recirculation to cooling zones. Recirculation flow is adjusted to meet required system temperatures and pressures. The method and system provide efficiency improvements, reducing fuel requirements and greenhouse gas emissions.

A candle having a body of a meltable fuel and a planar wick. When lit, the candle provides a unique flame formation, usable in a variety of decorative applications. The wick can be configured to evenly deplete the meltable fuel, while allowing for candles having relatively large and unique body configurations. The body of candle and/or the wick may include scented oil to promote the release of fragrance upon heating. The wick preferably is formed of wood, thereby providing an acoustic contribution to ambiance and improved combustion that generates less soot than conventional cotton wick candles.

A method of transferring a foil comprising: forming a foil transferring face on a photoreceptor employing a foil transferring face forming toner; transferring the foil transferring face onto a base substance, followed by fixing the foil transferring face; supplying a transfer foil having at least a foil and an adhesive layer on the base substance having the fixed foil transferring face, heating the transfer foil and the foil transferring face while the adhesive layer of the transfer foil is in contact with the foil transferring face to adhere the foil onto the foil transferring face; removing the transfer foil from the base substance while leaving the foil adhered onto the foil transferring face, wherein the foil transferring face forming toner comprises at least a binder resin, wherein the binder resin comprises a polymer formed by using a vinyl monomer comprising at least a carboxyl group.

Provided is a method of producing an electrophotographic photosensitive member having improved sensitivity and capable of outputting an image having less image defects due to a ghost phenomenon not only under a normal-temperature, normal-humidity environment but also under a low-temperature, low-humidity environment as a particularly severe condition. The method of producing a gallium phthalocyanine crystal includes subjecting a gallium phthalocyanine and a specific amine compound, which are added to a solvent, to a milling treatment to perform crystal transformation of the gallium phthalocyanine. In addition, the gallium phthalocyanine crystal is used in the photosensitive layer of the electrophotographic photosensitive member.

A method for producing a liquid developer containing toner particles containing a resin containing a polyester and a pigment, and an insulating liquid, wherein the toner particles are dispersed in the insulating liquid, including: step 1: melt-kneading the resin and the pigment, and pulverizing a melt-kneaded mixture to provide toner particles; step 2: dispersing the toner particles obtained in the step 1 in the insulating liquid in the presence of a basic dispersant to provide a dispersion of toner particles; and step 3: wet-milling the dispersion of toner particles obtained in the step 2 to provide a liquid developer, wherein the basic dispersant is an amide compound obtained by a reaction between a polyethyleneimine and a polyester (D) obtained by self-condensation of 12-hydroxystearic acid. The liquid developer obtained by the method of the present invention can be suitably used in development of latent images formed in, for example, an electrophotographic method, an electrostatic recording method, an electrostatic printing method, or the like.

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.

A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.

Disclosed are methods for making read sensors using developable bottom anti-reflective coating and amorphous carbon (a-C) layers as junction milling masks. The methods described herein provide an excellent chemical mechanical polishing or planarization (CMP) stop, and improve control in reader critical physical parameters, shield to shield spacing (SSS) and free layer track width (FLTW).

A substrate for an organic light-emitting device which can improve the light extraction efficiency of an organic light-emitting device while realizing an intended level of transmittance, a method of fabricating the same, and an organic light-emitting device having the same. Light emitted from the OLED is emitted outward through the substrate. The substrate includes a substrate body and a number of crystallized particles disposed inside the substrate body, the number of crystallized particles forming a pattern inside the substrate body.

Provided is a method for manufacturing a liquid crystal display device that includes a photoalignment film. The photoalignment film is formed from a liquid crystal alignment agent, and aligns liquid crystal molecules horizontally to the main face of the at least one of the substrates. The liquid crystal alignment agent contains a solvent and at least two kinds of polyamic acids or their derivatives obtained by reacting diamine and tetracarboxylic dianhydride. At least two of the diamines and at least one of the tetracarboxylic dianhydrides are compounds represented by predetermined formulas. The method includes the steps of: (1) forming the film of the liquid crystal alignment agent; (2) pre-baking the film; (3) irradiating the pre-baked film with light; and (4) post-baking the irradiated film, the step (4) including an operation of post-baking the film multiple times at temperatures ranging from low to high temperatures.

Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material may be formed by spin-casting a conformal layer of the first material across the features, or by selective deposition along the features relative to the substrate. After the first material is formed, fill material may be provided between the features while leaving regions of the first material exposed. The exposed regions of the first material may then be selectively removed relative to both the fill material and the features to create the pattern of openings.

In a method for producing a cleaning blade, a first composition obtained by causing a reaction of diphenylmethane diisocyanate and a first aliphatic polyester polyol which has a number-average molecular weight of 2000 to 3500 and is used in an amount of 20 to 40 mol % relative to the diphenylmethane diisocyanate and a second composition containing a urethane rubber-synthesizing catalyst and a second aliphatic polyester polyol which has a number-average molecular weight of 2000 to 3500 and is the same as or different from the first aliphatic polyester polyol are mixed so that a relationship between a number of moles (MNCO [mol]) of an NCO group in the first composition and a number of moles (MOH [mol]) of an OH group in the second composition satisfies 0.05≦MOH/MNCO≦0.20.

A mask includes a substantially transparent portion. The mask further includes a halftone portion abutting the substantially transparent portion, a light transmittance of the halftone portion being greater than 0% and less than 100%. The mask further includes a blocking portion abutting the halftone portion, a light transmittance of the blocking portion being less than the light transmittance of the halftone portion.

Provided are an electrophotographic photosensitive member in which leakage doesn't easily occur, a process cartridge and an electrophotographic apparatus each including the electrophotographic photosensitive member, and a method of manufacturing the electrophotographic photosensitive member. The electrophotographic photosensitive member includes a conductive layer including titanium oxide particle coated with tin oxide doped with a hetero element. When an absolute value of a maximum current amount flowing through the conductive layer in a case of performing a test of applying −1.0 kV including DC voltage to the conductive layer is defined as Ia, and an absolute value of a current amount flowing through the conductive layer in a case where a decrease ratio of a current amount per minute reaches 1% or less for the first time is defined as Ib, the relations of Ia≦6000 and 10≦Ib are satisfied. A volume resistivity of the conductive layer before the test is 1.0×108 Ω·cm to 5.0×1012 Ω·cm.

To provide an amine compound, represented by General Formula (I) below: [In General Formula (I), R1 and R2 represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aromatic hydrocarbon group, which may be identical or different; m and n are an integer of 1 or 0; Ar1 represents a substituted or unsubstituted aromatic hydrocarbon group; Ar2 and Ar3 represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aromatic hydrocarbon group; and Ar1 and Ar2 or Ar2 and Ar3 may bind to each other to form a substituted or unsubstituted heterocyclic group including a nitrogen atom.]

A solution of a gallium phthalocyanine contains a compound of formula (1) and a gallium phthalocyanine of formula (2), H2N—CH2—R1—CH2—NH2 (1) wherein R1 represents a single bond, or a substituted or unsubstituted alkylene group having 1 to 10 main-chain carbon atoms, a substituent of the substituted alkylene group is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, or a hydroxy group, one of the carbon atoms in the main chain of the alkylene group may be replaced with an oxygen atom, a sulfur atom, or a bivalent group represented by the formula —NR2—, and R2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, and wherein X1 represents a chlorine atom or hydroxy group.

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

A method of tailoring the shape of a plurality of relief printing dots created in a photosensitive printing blank during a platemaking process including the steps of: (a) selectively exposing at least one photocurable layer to a source of actinic radiation to selectively crosslink and cure the at least one photocurable layer; and (b) developing the exposed at least one photocurable layer to reveal the relief image therein, said relief image comprising the plurality of relief printing dots. The source of actinic radiation comprises a source of UV light in the UV-A range and a source of light in the UV-C range. The at least one photocurable layer is simultaneously exposed to the source of UV light in the UV-A range and the source of UV light in the UV-C range to produce printing dots having at least one desired geometric characteristic.

A microstructure manufacturing method includes forming a layer of a photosensitive resin on a substrate surface having an electrical conductivity, forming a structure of the photosensitive resin by exposing the layer of the photosensitive resin to light and developing the layer of the photosensitive resin to expose a part of the substrate surface, forming a first plated layer on the exposed part of the substrate surface by soaking the structure of the photosensitive resin in a first plating solution, curing the structure of the photosensitive resin after forming the first plated layer, removing at least part of the first plated layer after curing the structure of the photosensitive resin, and forming a second plated layer on a part where the first plated layer is removed, by soaking the structure of the photosensitive resin in a second plating solution different from the first plating solution.

A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes, a plurality of first assist features for restricting pattern distortion of the first dummy contact holes disposed inside a corresponding one of the first dummy contact holes, and an array of second assist features for additionally restricting pattern distortion of the first dummy contact holes. The array of second assist features is disposed outside of the first dummy contact holes. The method also includes forming an array of contact holes and first dummy contact holes on a wafer by using the photomask as an exposure mask.

Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.

A manufacturing method of an organic light emitting display device is disclosed which includes: forming a thin film transistor on each sub-pixel region which is defined in a substrate; forming a passivation layer on the substrate provided with the thin film transistor; forming a first electrode of an organic light emitting diode in each sub-pixel region of the passivation layer; forming a bank pattern in boundaries of the sub-pixel region of the passivation layer; forming a photoresist pattern, which exposes a first sub-pixel region, on the bank pattern; forming an organic light emission layer on the first electrode within the first sub-pixel region and an organic material layer on the photoresist pattern by depositing an organic material on the entire surface of the substrate provided with the photoresist pattern; and removing the photoresist pattern and the organic material pattern using a detachment film.

The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays pass through the mask and the transparent substrate to reach the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the transparent substrate and the photo-resist layer back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.

Provided is a method of producing an electrophotographic photosensitive member having improved sensitivity and capable of outputting an image having less image defects due to a ghost phenomenon not only under a normal-temperature, normal-humidity environment but also under a low-temperature, low-humidity environment as a particularly severe condition. The method of producing a gallium phthalocyanine crystal includes subjecting a gallium phthalocyanine and a specific amine compound, which are added to a solvent, to a milling treatment to perform crystal transformation of the gallium phthalocyanine. In addition, the gallium phthalocyanine crystal is used in the photosensitive layer of the electrophotographic photosensitive member.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

A mask blank for use in the manufacture of a binary mask adapted to be applied with ArF excimer laser exposure light has, on a transparent substrate, a light-shielding film for forming a transfer pattern. The light-shielding film has a laminated structure of a lower layer and an upper layer and has an optical density of 2.8 or more for exposure light and a thickness of 45 nm or less. The lower layer is made of a material in which the total content of a transition metal and silicon is 90 at % or more, and has a thickness of 30 nm or more. The upper layer has a thickness of 3 nm or more and 6 nm or less. The phase difference between exposure light transmitted through the light-shielding film and exposure light transmitted in air for a distance equal to the thickness of the light-shielding film is 30 degrees or less.

A tuning apparatus for a keyboard musical instrument, having a load applicator for applying a load of a predetermined value to a string set up in place, a calculating device for calculating a deviation between a displacement value of the string produced when the load is applied to the string and a preset value of displacement predetermined to give a required frequency of vibration, and a rotating device for turning a tuning pin until the deviation calculated by the calculating device is reduced to zero.

A method for electronically processing and storing musical information involves separating the musical information into a plurality of segments, each representing some portion of a measure, and assigning a sequential time dimension value to each segment. The musical information is also separated into plurality of channels, with each channel representing a sound source and having a sound dimension value assigned to it. The musical information for a given channel and segment is stored in a memory array by associating the musical information corresponding to a given channel and segment with the memory array node specified by the time dimension value and sound dimension value assigned to the given channel and segment.

In production of a casein-type artificial key material for keyboard musical instruments, fine grains of an elastomer such as polyurethane elastomer are added to a mixture to be kneaded together so that, in the structure of the product, islanded elastomer is uniformly dispersed in the matrix of casein. Inbred brittleness of casein is much improved by inclusion of the elastomer and strong bond between casein and the elastomer well removes the danger of interface separation.

Support devices for a woodwind musical instrument, and methods for making such support devices. A support device includes a strap for hanging from the neck of the user. Attached to the strap is a brace shaped to receive the instrument. This way the instrument is suspended from the neck of the user. Preferably the brace is such that the strap is attached so that no portion of the strap contacts the instrument, when it is so supported.

An apparatus for the carrying of a woodwind musical instrument, known as a recorder, consisting of a ring with sufficient inside diameter to fit around the shaft of the recorder and a strap attached to the ring and of sufficient length so as to fit around the neck of the person playing the recorder and allowing the recorder to hang in a position of easy access to the user.

A tuning device includes a pitch extraction device with which the pitch of an input signal is extracted and a deviation detection device with which the deviation of the pitch that has been extracted by the pitch extraction device from a standard pitch is detected. The deviation that has been detected by the deviation detection device is displayed by an indicator of a mechanical meter. The tuning device also includes an ultrasonic motor that drives the indicator. A controller drives the ultrasonic motor in conformance with the deviation that has been detected by the deviation detection device. The controller, by driving the indicator using the ultrasonic motor, arranges the indicator in the standard position in those cases where the deviation that has been detected by the deviation detection device is zero, and moves the indicator up to a position in the positive direction that corresponds to the deviation in those cases where the deviation is a positive value and moves the indicator up to a position in the negative direction that corresponds to the deviation in those cases where the deviation is a negative value.

Provided is a method for performing a handover from a first base station to a second base station by a user equipment that is performing a radio communication over a communication channel formed by aggregating a plurality of component carriers. The method includes a step of transmitting a handover command for a component carrier for which a handover has been approved by the second base station among the plurality of component carriers from the first base station to the user equipment and a step of trying to make an access from the user equipment to the second base station for each component carrier in response to the handover command.

A wireless access system and, more particularly, a method and apparatus for more efficiently performing zone switch are disclosed. The method of performing zone switch by an advanced mobile station (AMS) in a mixed-mode advanced base station (ABS) which operates in a mixed mode of a broadband wireless access system includes receiving a ranging response (RNG-RSP) message including system information of an AMS support zone from a legacy zone (LZone) of the ABS, and performing ranging to the AMS support zone using the system information.

Embodiments of the present invention disclose a method and a device for determining a target cell. The method includes: acquiring information about a candidate cell for a mobile terminal; and determining the candidate cell as a target cell for the mobile terminal if the candidate cell is a preferred cell determined according to cell statistic information, where the cell statistic information includes: specific information about a cell having served the mobile terminal and specific information about the mobile terminal in the cell having served the mobile terminal. According to the solutions provided in the embodiments of the present invention, a proper target cell may be determined for a mobile terminal, thereby avoiding a large number of handovers and reselections and saving network resources.

A method for operating a base station in a wireless communication system in order to support a plurality of characteristics is provided. The method includes allocating resource periods for respective characteristics, transmitting system information including information on the characteristics, transmitting a reference signal with the characteristic corresponding to the relevant resource period through at least one of the resource periods, and receiving feedback information determining channel qualities for all of the characteristics.

This specification describes a method and corresponding system for reducing aggregate forward link transmission power. In one arrangement, a RAN may reduce the aggregate transmission power level in a coverage area by (i) determining which WCDs in the coverage area have a communication error rate that is at least a threshold level of communication error rate, and in response to the determining, (ii) reducing the forward link transmission power level of the determined WCDs. In another arrangement, the RAN may reduce the aggregate transmission power level in a coverage area by reducing the forward link transmission power of WCDs in the coverage area that have (i) a forward link transmission power level that is at least a threshold level of forward link transmission power and (ii) a communication error rate that is at least a threshold level of communication error rate.

Method and Apparatus thereof, for controlling intercell interference in a radio communications system having a plurality of user equipment and a plurality of access nodes including the steps of: a user equipment of said plurality connected to a serving access node, upon determining that an access node of said plurality is causing interference, transmitting a request to said serving access node; said serving access node forwarding said request to an apparatus controlling said interfering access node over an X2 interface, and said apparatus, instructing said interfering access node to execute said request.

A mode-based method of social networking comprising storing in a database profile information for a plurality of users, event information for a plurality of events and a mode associated with each event, receiving by a plurality of computerized user devices a selection of a mode and one or more geographic proximity parameter selections from a each of plurality of users, displaying, event information for an event having a same mode as the first user, profile information for one or more other users among the plurality of users having selected the same mode as the first user and located within a geographic proximity parameter selected by the first user, and a density of a plurality of users located within the geographic proximity parameter selected by the first user wherein the density is represented by a color corresponding to the mode.