clean

Aquarium with a self-contained cleaning apparatus

The present invention relates to an aquarium cleaning apparatus, systems and methods for removing debris from the aquarium, and in particular, a self-contained cleaning apparatus that utilizes a siphon effect created by pouring water in an aquarium tank and/or pulling water out of an aquarium tank, such as via a vacuum. In a preferred embodiment, the siphon operation occurs because of the difference between the water level of the aquarium tank and the vertical height of a spout attached to the top of a vertical tube. Therefore, it is not necessary for the user to immerse their hands in the aquarium water to operate the cleaning device.




clean

Self-cleaning air filtration system

A self-cleaning system and method for removing contaminants captured by an air flow filter media in which a reverse air flow is directed back through the filter media and into an antechamber which is closed during self-cleaning and a vacuum source is connected to the antechamber to quickly evacuate the air in said antechamber containing dislodged contaminants suspended therein.




clean

Method and device for gas cleaning

A method for separating particles from particle-laden gas. Charged particles are formed by charging particles of a particle-laden gas. A gas jet is provided by guiding the particle-laden gas by a flow guide. Particles from the gas jet are collected to a collecting electrode by an electric field. An effective collecting area of the collecting electrode is positioned such that gas velocity gradient at each point of the effective collecting area is smaller than 10% of the maximum gas velocity in the gas jet divided by the height dimension of the jet.




clean

Apparatus and method for cleaning regenerative-burner media bed

A regenerative burner device for a furnace and a method of removing contaminants from such a device. The burner device includes a burner for introducing heat and waste gas into a furnace during ignition when supplied with fuel and a combustion gas, a media bed comprising refractory particles, and ducting for delivering combustion gas to said burner during ignition, and for drawing waste gas from said furnace on termination of ignition. The ducting causes the combustion gas and the waste gas to pass in succession through the media bed. Means are provided for periodically delivering a rapid flow of a decontaminating gas into said media bed. The rapid flow is of sufficient force to dislodge contaminants collected in the media bed from said waste gas.




clean

Side edge cleaning methods and apparatus for thin film photovoltaic devices

Methods for cleaning a side edge of a thin film photovoltaic substrate utilizing a laser are provided. The method can include transporting the substrate in a machine direction to move the substrate past a first laser source, and focusing a first laser beam generated by the first laser source onto the side edge of the substrate such that the laser beam removes the thin film present on the side edge of the substrate. An apparatus is also generally provided for cleaning a first side edge and a second side edge of a thin film photovoltaic substrate.




clean

Cleaning/disinfecting apparatus

A cleaning/disinfecting apparatus includes: a plurality of attachment portions for attaching an endoscope; a cleaning/disinfecting portion that communicates with the plurality of attachment portions and can execute different types of cleaning/disinfection menus for the respective attachment portions; and an endoscope information reading portion that reads endoscope information from the endoscope. Also, the cleaning/disinfecting apparatus includes: a control portion that determines a cleaning/disinfection menu based on the read endoscope information and outputs attachment portion identifying information for identifying an attachment portion for executing the determined cleaning/disinfection menu; and a notifying portion that notifies the attachment portion identifying information outputted from the control portion.




clean

Surface cleaning head

A surface cleaning head is provided comprising a dome-shaped, downwardly open housing, in which at least one spray arm is mounted for rotation about an axis of rotation, wherein the spray arm bears at a distance from the axis of rotation a nozzle which can be acted upon with cleaning fluid subject to pressure and revolves around the axis of rotation together with the spray arm, and comprising a protective disk which covers the at least one spray arm towards the open underside of the housing and defines a ring-shaped fluid passage for a stream of fluid to pass through, said fluid passage being penetrated by retaining bars, wherein the at least one spray arm is rotatable relative to the protective disk. The retaining bars are arranged so as to be distributed unevenly in circumferential direction.




clean

Method for cleaning inside of pressure tight container for blasting treatment

Provided is a method for cleaning the inside of a pressure tight container for a blasting treatment, wherein the inside of a pressure tight container can be cleaned for a short period of time after a blasting treatment. The method is comprised of a setting process wherein a cleaning blast (1) capable of cracking a part of a residual substance remaining on the inside of a pressure tight container (10), and a solid separating material (2) which collides with a substance bonded to an inner wall surface (32a) of the pressure tight container (10), to separate the bonded substance from the inner wall surface (32a) of the pressure tight container (10), are set on the inside of the pressure tight container (10); and a separation process wherein the cleaning blast (1) blasts on the inside of the pressure tight container (10), to crack a part of the residual substance remaining on the inside of the pressure tight container (10), and the separating material (2) is divided into a plurality of granular elements by the blast, so that the granular elements are spread, and collide with the bonded substance to remove the bonded substance.




clean

Cleaning device with single tank recycling system

A cleaning device may include a solution tank configured to store cleaning solution. The solution tank may include an inlet and an outlet. The cleaning device may include at least one discharge line filter in fluid communication with the solution tank and a pump having a pump intake and a pump discharge. The pump may be configured to direct cleaning solution from the solution tank outlet through the at least one discharge line filter. The cleaning device may include a cleaning head in fluid communication with the pump discharge and a bypass line in fluid communication with the pump discharge and the inlet. The bypass line may be configured to divert cleaning solution received from the pump discharge away from the cleaning head and toward the solution tank.




clean

System and method for cleaning tokens

A system and method for securing tokens to be cleaned includes a tray with a curved surface defining a channel extending along a first direction and spacers projecting from the curved surface into the channel. The spacers are disposed at regular intervals along the first direction. The curved surface also has at least one opening. The tokens may be inserted into the channel between adjacent spacers and the tray holding the tokens can be submerged into a cleaning liquid. Identical trays containing tokens can also be stacked and together submerged into the cleaning liquid. The tray holding the tokens can be placed on a drying surface that has a drainage hole, and wetness remaining on the tokens can be sucked through the hole in the channel and the drainage hole by a vacuum or blown through the hole in the channel and drainage hole by an air blower.




clean

Substrate clean solution for copper contamination removal

Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants from a substrate surface is provided which includes exposing a substrate to a peroxide clean solution, exposing the substrate to a hydroxide clean solution, and exposing the substrate to a selective etch solution containing potassium iodide, iodine, sulfuric acid, and water during a selective etch process. The substrate generally contains gallium arsenide material, such as crystalline gallium arsenide, and is usually a growth substrate for an epitaxial lift off (ELO) process. The copper or other metallic contaminants disposed on the substrate may be selectively etched at a rate of about 500 times, about 1,000 times, about 2,000 times, or about 4,000 times or greater than the gallium arsenide material.




clean

Substrate cleaning method and substrate cleaning device

A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate.




clean

Method and apparatus for cleaning a film seperating device

A method for cleaning a film separating device involves: a) performing positive-direction water cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is less than 1.2; b) performing reverse water cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 1.2; c) performing reverse chemical cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 2; d) performing positive-direction chemical cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 3.




clean

Fluid applicator and glass cleaning process

A fluid applicator (20), for cleaning particles from a glass sheet (2), including a conveyor (40) for supporting the glass sheet, a conveyance plane, and a nozzle (24). The conveyance plane is disposed adjacent the conveyor so that when the glass sheet is conveyed by the conveyor, a surface (6) of the glass sheet is disposed in the conveyance plane. The nozzle has a longitudinal axis (23), wherein the longitudinal axis is disposed at an angle of 30 to 90 degrees with respect to the conveyance plane, and the nozzle is disposed at a distance (21) of less than or equal to 100 mm from the conveyance plane. Also, there is disclosed a method for cleaning particles from a glass sheet, using the fluid applicator. The fluid may be delivered to the nozzle at a pressure of 10 to 80 kg/cm2 and a flow rate of from 1 to 20 l/min.




clean

Cleaning system having heated cleaning enclosure for cleaning heat exchanger tube bundles

An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.




clean

Painting implement cleaning and support apparatus

A painting implement cleaning and storage apparatus 10 is provided. The apparatus facilitates the cleaning and storage of painting implements such as a roller 12, a brush 14 and a roller pan 16. The apparatus includes a base 18 and a bracket 32 coupled to the base. The roller 12 is supported on the bracket 32 in an upwardly extending diagonal position between shields 45 and 54 for containing paint spreads from the roller. The brush 14 is supported on bracket 32 in a upwardly projecting position. A roller pan 16 is coupable to shield 45 and supported thereon in a descending position. Once the painting implements 12, 14 and 16 are supported on the apparatus 10, cleaning can be accomplished by the application of a stream of water thereto after which the implements can be left until they are needed.




clean

Cleaning compositions for use in closed loop cleaning machines

Embodiments of the present disclosure include cleaning processes, closed loop cleaning machines, and methods of cleaning an article. The cleaning process includes contacting a surface of an article with a cleaning composition in a cleaning chamber, where the cleaning composition includes at least about 85 percent by weight organic solvents, based on total weight of the cleaning composition, and where at least about 5 percent by weight of the organic solvents is propylene glycol, based on total weight of the organic solvents, to clean the surface of the article, collecting the cleaning composition including contaminants, and recovering the cleaning composition via distillation, where a distillation apparatus removes the contaminants from the cleaning composition and is connected to the cleaning chamber by a process stream.




clean

Method of cleaning tubes

A method for grit blasting tubes and for blowing swabs through tubes, automatically sensing that the swab has passed through the tube, and logging the event. Also, various methods are used for inserting the swabs into the tubes efficiently.




clean

Reticle chuck cleaner

According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.




clean

Cleaning machine

A cleaning machine for containers, containing a housing in which various treatment stations, including a feed station and a discharge station, are accommodated, whereby the housing has two side walls located opposite each other. In order to simplify the installation of the cleaning machine, a modular construction is used, whereby at least the discharge station is formed as a module.




clean

Cleaning and/or unblocking of process equipment

A method of cleaning an internal component (14) of a process vessel (10) includes opening a guide (42) extending at least from a vessel access port or entry nozzle (38) to the internal component (14), guiding a cleaning agent/device by means of the guide (42) to the internal component (14), cleaning the internal component (14) with the cleaning agent/device, and closing the guide (42). The process vessel (10) is then operated with the guide (42) remaining in the process vessel (10).




clean

Cleaning system for a beverage machine, preferably a coffee machine

The invention relates to a cleaning system for coffee machines, comprising a cleaning device for periodically cleaning the coffee- and/or milk-carrying components using a cleaning liquid, which contains cleaning agent in the form of balls or tablets dissolved therein, wherein the cleaning device is provided with a time- and/or product-cycle-dependent controller and a metering apparatus (1) for the cleaning agent (10) that interacts with the controller. Thus, it is possible to program the cleaning process in a customized manner according to the mode of operation and to carry out the cleaning process fully automatically according to the program. The metering of the cleaning agent (10) according to the program ensures an always optimal cleaning effect together with sparing use of cleaning agents. Simple and safe handling is achieved by using ball- or tablet-shaped cleaning agents.




clean

Steam cleaning apparatus

A steam cleaning apparatus including a main body having a main switch, a steam cleaning head coupled to the main body, and a position sensitive switch having a first state when the steam apparatus is in a substantially vertical storage position and a second state when the steam cleaning apparatus is in a tilted, cleaning position, the position sensitive switch being connected in electrical series with the main switch such that when the position-sensitive switch is in the first state the position-sensitive switch interrupts the flow of electrical current from the main switch and when the position-sensitive switch is in the second state, electrical power is supplied by the main switch.




clean

Low foam media cleaning detergent with nonionic surfactants

A detergent for cleaning media is provided. The detergent comprises deionized water, between about 1% and about 5% by weight of a nonionic surfactant having an hydrophile/lipophile balance (HLB) value between about 10 and about 20, and an ethoxylation level between about 5 and about 20, between about 1% and about 5% by weight of a dispersing agent, between about 3% and about 10% by weight of a chelating agent comprising phosphonic acid, and between about 2% and about 6% by weight of an inorganic salt.




clean

Self-cleaning wiresaw apparatus and method

The present invention provides a self-cleaning wiresaw cutting apparatus including a cleaning mechanism adapted to clean the components of the wiresaw before, during, or after a cutting process or to humidify the cutting region of the apparatus. The apparatus contains at least one dispenser adapted to dispense an aqueous fluid onto various components of the wiresaw.




clean

Non-electroslag remelting type clean metal ingot mold

A non-electroslag remelting type clean metal ingot mold includes an ingot mold body and a insulating riser arranged on the ingot mold body; an insulated heating and heat preservation device is vertically arranged in the ingot mold body and divides the space in the ingot mold body into a plurality of independent cavity units; and the cavity units are distributed in two rows in the ingot mold body. Because the insulated heating and heat preservation device is arranged in the ingot mold body and divides the space in the ingot mold body into a plurality of independent cavity units, most of impurities and segregates in liquid metals are enriched in the part in contact with the isolation and heat insulation mechanism during the directional solidification and crystallization of the liquid metals and the enriched alloy segregates, and the impurities can be easily eliminated by utilizing flame or other processing methods.




clean

Clean metal ingot mold

A clean metal ingot mold comprises an ingot mold body and an insulating riser arranged on the ingot mold body. The bottom mold plate of the ingot mold is provided with at least a ridge connected thereto. The region having a V-shape containing impurities produced during the crystallization process of the liquid metal moves upwards because of the ridge, and then the impurities depart from the center of the cast ingot and the impurities are more centralized. A water-cooling device is arranged in the ridge to allow the temperature of the metal in the ingot mold to decrease rapidly, and the crystallization process of the metal to be rapid.




clean

Foundry mixture and related methods for casting and cleaning cast metal parts

A foundry mixture for making molds used for molding cast metal parts includes foundry sand, a non-aqueous binder, and a cleaning agent that includes calcium oxide. Residual foundry mixture remaining on the cast part after removal from the mold is removed by electrolytic cleaning of the cast part.




clean

Coffee machine comprising a frothing device and means for cleaning the frothing device and a milk suction line and process for rinsing the milk suction line

A coffee machine comprises a frothing device, wherein an internal milk channel leading to a frothing chamber is provided into which opens a bypass air inlet for operable air supply to the frothing device. A flexible milk suction line connects the frothing device with a milk supply container. Means are provided for cleaning the frothing device and the milk suction line with rinsing water from a continuous-flow water heater of the coffee machine. A controlled valve arrangement is provided which feeds rinsing water from the continuous-flow water heater to the bypass air inlet of the frothing device. A milk suction end of the milk suction line is directly or indirectly, fluid-conductively connectable with a residual water pan of the coffee machine prior to feeding rinsing water to the bypass air inlet.




clean

Stitch bonded cleaning material

A wipe structure of stitch bonded construction incorporating one or more substrate layers of an absorbent material with a barrier layer across a face side of the absorbent material and a preformed lightweight loop fabric disposed across the underside of the absorbent layers with loops projecting away from the absorbent layers.




clean

CLEANING SOLUTION, SET OF INK AND CLEANING SOLUTION, CLEANING SOLUTION STORED CONTAINER, INKJET PRINTING APPARATUS, AND INKJET PRINTING METHOD

Provided is a cleaning solution used for cleaning an ink containing a resin in an amount of 5 percent by mass or greater, the cleaning solution including a mixture solvent containing water and a solvent, wherein a hydrogen bond term of a Hansen solubility parameter of the mixture solvent is 7.0 (cal/cm3)1/2 or less.




clean

Oil spill clean-up vessel with ice displacement capabilities

An oil spill clean-up apparatus and method, and more specifically to a self-contained oil spill clean-up vessel with ice displacement capabilities. One preferred oil spill clean-up system includes a vessel subsystem, an ice displacement subsystem, and an oil spill skimming subsystem. Preferred oil spill clean-up systems may include at least one storage subsystem. Preferred oil spill clean-up systems may include an oil/water separation and removal subsystem.




clean

Centrifugal dryer with replaceable blades and self-cleaning rotor seal and centrifugal dewatering tower

A centrifugal pellet dryer with a self-cleaning rotor seal, replaceable wear plates, and a fluid powered dewatering tower is presented. The self-cleaning rotor seal includes a plurality of grooves that are structured to eject pellet debris that migrates into between the seal and the housing for the rotor. The replaceable wear plates are secured to the rotor at locations such that they contact pellets that are entering the rotor housing. The dewatering tower includes a helical augur that dewaters a pellet slurry and delivers partially dried pellets to the rotor housing.




clean

Laundry lint filter cleaning machine

The present invention relates to a laundry treating machine, including an air supply unit for supplying air, a tub for having the air supplied thereto from the air supply unit to treat the laundry, the tub having an air recovery opening formed in an outside circumferential surface thereof for recovery of the air to the air supply unit, a lint filter mounted to an inside of the air recovery opening for filtering the lint from the air, a filter cleaning unit for spraying cleaning water to separate the lint from the lint filter, and a flow passage member for guiding the cleaning water dropping from the lint filter to an inside of the tub to an inside surface of the tub.




clean

System and method for cleaning grain dryer screen

A system for cleaning a grain dryer screen includes a grain dryer screen supported within a grain bin and having a grain contacting surface opposing a grain debris contacting surface. A drying airflow path through the grain dryer screen is defined sequentially by the grain debris contacting surface and the grain contacting surface. A cleaning assembly includes a first cleaning arm mounted within the grain bin and disposed along the grain debris contacting surface. A cleaning assembly powering system is configured to move the first cleaning arm along a predetermined cleaning path relative to the grain debris contacting surface.




clean

Heating appliance covered with a self-cleaning coating and production method thereof

A heating appliance including a metal substrate, at least a part of which is covered with a self-cleaning coating including at least one oxidation catalyst selected from the platinoid oxides, and at least one dopant of said oxidation catalyst selected from the rare-earth oxides. The self-cleaning coating is a bilayer coating including: an inner layer at least partially covering the metal substrate and including the dopant; and an outer layer in contact with the ambient air and including the oxidation catalyst. Also provided is a method for producing such a heating appliance.




clean

Self cleaning and lubricating all-weather fishing lines and methods of manufacture thereof

Improved self cleaning and lubricating all-weather fishing lines and methods of manufacture are disclosed. The line includes a core line portion of polyester multifilament fiber and a coating portion, the coating formed by a thermoplastic polyester elastomer mixed with a blowing agent . The methods of this invention are characterized by the use of a finely ground powder of copolymer and blowing agent processed through a medical-quality elongated mixing screw at the line coating unit and very low processing temperatures.




clean

Roller cleaner

A cleaning device is provided for removing debris from rotating conveyor rollers, and includes a housing constructed and arranged for insertion between two adjacent rotating rollers, the housing having a first set of cleaning wheels at a first housing end associated with a first of the conveyor rollers, and a second set of cleaning wheels located on an opposite end of the housing and associated with a second of the conveyor rollers. At least one of the cleaning wheels is reciprocable relative to the housing between a retracted position permitting insertion of the housing between the rollers, and a extended position extending the reciprocating wheel towards the adjacent roller for limiting lateral movement of the housing between the rollers. Upon movement of the housing between the rollers in a direction parallel to a longitudinal axis of the rollers, the cleaning wheels operationally engage and remove residue collected on the rollers.




clean

Cleanable conveyor-belt drive system

A hygienic drive system for a belt conveyor. The drive system has a stator rigidly mounted in a housing having an outer bearing surface that is continuous with the outer surface of mounting supports and avoids hard-to-clean nooks. A rotor assembly formed by drive wheels rotatably mounted on the outer surface of the housing or by a magnetic belt wrapped around a portion of the outer surface is rotated by a rotating magnetic wave produced by the stator. The stator and rotor can form an induction motor or a synchronous motor.




clean

Plasma sterilization and cleaning treatment device for escalator, and escalator using the same

Sterilization and cleaning of an escalator hand rail are performed. A sterilization and cleaning device including a hand rail; a plasma source for irradiating the hand rails with ions or radicals or UV light; an enclosure for housing the plasma source; a power source for generating plasma; a fan for generating relatively negative pressure in the enclosure; filter units for removing removed bacteria, viruses, and organic matters such as hand marks; and filter plates located backward and forward of a moving direction of the hand rail in the enclosure along the hand rail is provided.




clean

ORAL AND DENTAL CARE AND CLEANING AGENTS COMPRISING PHOSPHATE-CONTAINING AND/OR PHOSPHONATE-CONTAINING POLYURETHANE POLYMERS

The present invention relates to oral and dental care and cleaning agents comprising an aqueous dispersion of a phosphate-containing and/or phosphonate-containing polyurethane polymer and anionic surfactant(s), to tooth cleaning methods using these agents, and to the use of oral and dental care and cleaning agents comprising an aqueous dispersion of a phosphate-containing and/or phosphonate-containing polyurethane polymer and anionic surfactant(s) to reduce the restaining of teeth and/or to reduce biofilm development on dental surfaces and/or to reduce the adhesion of bacteria to dental surfaces and/or to extend the antibacterial action of antibacterial substances.




clean

Cleaning method

The invention provides a method and formulation for cleaning a soiled substrate, the method comprising the treatment of the moistened substrate with a formulation comprising a multiplicity of polymeric particles, wherein the formulation is free of organic solvents. Preferably, the substrate is wetted so as to achieve a substrate to water ratio of between 1:0.1 to 1:5 w/w. Optionally, the formulation additionally comprises at least one cleaning material and, in this embodiment, it is preferred that the polymeric particles are coated with the at least one cleaning material. Preferably, the cleaning material comprises a surfactant, which most preferably has detergent properties. Most preferably, the substrate comprises a textile fiber. Typically, the polymeric particles comprise particles of nylon, most preferably in the form of nylon chips. The results obtained are very much in line with those observed when carrying out conventional dry cleaning processes and the method provides the significant advantage that the use of solvents, with all the attendant drawbacks in terms of cost and environmental considerations, can be avoided.




clean

Fabric cleaning composition comprising hueing agent

A fabric cleaning composition comprising from 1% to 20% by weight of the fabric cleaning composition of an oxygen-based bleaching source and a hueing agent, and wherein the neat composition has a pH between 2.5 and 5.5, and a method of using said fabric cleaning composition.




clean

Laundry article having cleaning and conditioning properties

The invention discloses a laundry article used for both cleaning and conditioning fabrics comprising a water-insoluble nonwoven substrate and coated thereon into at least one zone each a detergent composition and a fabric conditioning composition. The fabric conditioning composition comprises a quaternary ammonium cationic surfactant, an alkoxylated fatty alcohol and a fatty acid.




clean

Liquid cleaning compositions

A cleaning composition according to one embodiment includes a surfactant system comprising nonionic surfactant in combination with an anionic surfactant; water present in an amount from 0 to about 40 wt % based on a total weight of the cleaning composition; a solvent system comprising a polyalcohol, the solvent system being present in an amount effective to solubilize the surfactant system in the water; and an enzyme present in an amount of less than about 15 wt %; wherein the cleaning composition is in a form of a continuous phase, wherein the cleaning composition is characterized as exhibiting about a constant cleaning efficacy as measured using test procedure ASTM D4265 when the cleaning composition is added to 69 liters of exterior water in amounts ranging from about 9 to about 22 grams of cleaning composition. Methods for pretreating and cleaning laundry and nontextile surfaces are also presented.




clean

Functional additives for cleansing compositions

Functional additives for cleansing compositions exhibiting enhanced anti soil-re-deposition and/or dye transfer inhibitory properties comprising polymers in the form of homopolymers, copolymers or terpolymers synthesized from at least one hydrophobic monomer. Examples of hydrophobic monomers include N-vinyl caprolactam, vinyl acetate, vinyl esters, acrylated glycols, methacrylamide, C1 to C12 alkyl- and C1 to C12 dialkylacrylamide, C1 to C12 alkyl- and C1 to C12 dialkylmethacrylamide, C1 to C12 alkyl aery late, C1 to C12 alkyl methacrylate, 4-butyl phenyl maleimide, octyl acrylamide.




clean

Cleaning method

The invention provides a method and formulation for cleaning a soiled substrate, the method comprising the treatment of the moistened substrate with a formulation comprising a multiplicity of polymeric particles, wherein the formulation is free of organic solvents. Preferably, the substrate is wetted so as to achieve a substrate to water ratio of between 1:0.1 to 1:5 w/w. Optionally, the formulation additionally comprises at least one cleaning material and, in this embodiment, it is preferred that the polymeric particles are coated with the at least one cleaning material. Preferably, the cleaning material comprises a surfactant, which most preferably has detergent properties. Most preferably, the substrate comprises a textile fiber. Typically, the polymeric particles comprise particles of nylon, most preferably in the form of nylon chips. The results obtained are very much in line with those observed when carrying out conventional dry cleaning processes and the method provides the significant advantage that the use of solvents, with all the attendant drawbacks in terms of cost and environmental considerations, can be avoided.




clean

Formulation for cleaning of hard surfaces and textiles

Concentrated cleaning formulations for removing debris from hard surfaces and textile surfaces. An exemplary formulation includes a mixture of the following chemical components, in specified proportions: glycerin;monopropylene glycol;triethylene glycol methyl ether;a non-ionic surfactant;an emulsifier;soya methyl ester or canola methyl ester, or both; andhydroxypropyl sulfonate; The formulation is free of water other than insignificant amounts present in the chemical components combined to make the mixture. Combining the formulation with water causes a temperature of the combination to increase above the temperatures of the water and the formulation before combining.




clean

Device on a spinning room preparation machine, for example a fibre flock feeder, carding machine, cleaner or the like, for supplying and/or discharging fibre material

In a device on a spinning room preparation machine, for example a fiber flock feeder, carding machine, cleaner or the like, for supplying and/or discharging fiber material, a tray-like guide element having a guide surface co-operates with at least one conveyor roll located opposite, the fiber material being guided towards and along the guide surface. In order to provide a simple way of supplying and/or discharging fiber material without undesirable adhesion of fibers, the guide element located opposite the at least one conveyor roll is arranged to be set in vibration by at least one actuator.




clean

DPF Cleaning Process Using a Temporary Plug

A method of removing or reducing the particulate buildup within the diesel particulate filter of an aftertreatment system includes the selective application of a blocking agent to a filter medium of the diesel particulate filter, displacement of the particulate from the filter medium using a fluid stream, and subsequent removal of the blocking agent.