Exposure apparatus and exposure method
The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays pass through the mask and the transparent substrate to reach the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the transparent substrate and the photo-resist layer back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.