There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1):wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, andwherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic cation or a metal cation,

A method of treating a surface of a substrate using modified urushiol derived from Toxicodendron vernicifluum is provided. More particularly, the reactivity of a hydroxyl group of urushiol extracted from fresh Toxicodendron vernicifluum is removed before the lacquer is used as a UV coating agent for a substrate such as a steel sheet. Therefore, the substrate may have high antibacterial activity, and excellent appearance and functionalities such as far-infrared radiation, blocking of electromagnetic waves, enhanced corrosion resistance, high crosslinking speed when a low content of a photoinitiator is used, excellent surface gloss and high scratch resistance.

According to the embodiments, a pattern formation method includes a process of formation of a self-assembly material layer containing at least a first segment and a second segment on a substrate having a guide layer, a process of formation of a neutralization coating on the self-assembly material layer, and a process of formation of a self-assembly pattern including a first region containing the first segment and a second region containing the second segment following phase separation of the self-assembly material layer.

In some embodiments, nerves surrounding arteries or leading to organs are targeted with energy sources to correct or modulate physiologic processes. In some embodiments, different types of energy sources are utilized singly or combined with one another. In some embodiments, bioactive agents or devices activated by the energy sources are delivered to the region of interest and the energy is enhanced by such agents.

An external ear canal pressure regulation device including a fluid flow generator and an earpiece having a first axial earpiece conduit fluidicly coupled to the fluid flow generator, whereby the earpiece has a compliant earpiece external surface configured to sealably engage an external ear canal as a barrier between an external ear canal pressure and an ambient pressure.

A heating, ventilation, and/or air conditioning (HVAC) furnace has a venturi premixer and a disturber disposed downstream relative to the premixer and in an undivided output of the venturi premixer.

A burner and an improved heat recuperator for a burner. The heat recuperator has a tubular body including a plurality of fins extending radially outward from the tubular body. The plurality of fins are disposed in a plurality of segments arranged longitudinally along the tubular body with the plurality of fins in each segment being disposed about a circumference of the tubular body. Adjacent segments of fins being circumferentially offset with one another.

A burner insert for use with a burner is provided. The burner insert includes a cylindrical body member having an inlet end and an outlet end. The cylindrical body includes a central passage and a plurality of openings disposed about the central passage. One or more fins are axially disposed within the central passage. A plurality of rib members are coupled to the body, each of the plurality of rib members axially disposed within one of the plurality of openings.

The invention relates to a burner comprising several substantially concentric channels, one (1) of which is arranged outside of all fuel supply conduits and is delimited by two pipes (2,3), whose axes (4) are placed in a parallel position and which are movable with respect to each other. According to said invention, diverting members (6) used for imparting a tangential component (7) to a fluid flowing in the channel (1) are carried by the first pipe (2) and are fixed thereto, the second pipe (3) comprises a drive portion (9) for driving the fluid outside the diverting members (6) and the angle of tangential deviation of the fluid at the downstream end (8) of the channel (1) depends on the axial position of the second pipe (3) with respect to the first pipe (2).

A signal conditioner for use with a controller and a burner receives an input signal from the controller. A conversion circuit generates a primary output signal corresponding to the input signal to control the burner. The signal conditioner also includes a delay circuit. The delay circuit overrides the primary output signal generated by the conversion circuit and substitutes a delay signal to the burner at a predetermined level for a predetermined time. The signal conditioner may also include a temperature override circuit, which receives a temperature of air from the burner. If the temperature is above or below established limits, the temperature override circuit substitutes a temperature override signal to the burner.

The finding concerns a multi-gas burner head with sucked or blown air, from which the mixture of fuel gas and comburent air comes out and the combustion occurs. Such a head is made from a metallic sheet in which there is at least one row of aligned slits (2), substantially rectangular-shaped; such a sheet is folded so as to have a series of flat flaps (3) in succession, each of the slits being arranged so as to be closed like a “sandwich” between two flat portions of the sheet, once the flaps of the structure are mutually compressed. The gas mixture is intended to pass from the bottom (5) of the flaps and then through the slits and finally to come out at two side by side crests (6) of the structure where the combustion occurs.

A burner for an exhaust aftertreatment system may include a housing assembly and an ignition device. The housing assembly may include an inner shell surrounded by intermediate and outer shells. The inner shell may at least partially define a combustion chamber. The housing assembly may include an airflow passage having an opening extending through the outer shell. The airflow passage may extend between the outer shell and the intermediate shell as well as between the intermediate shell and the inner shell. The airflow passage may provide fluid communication between the opening and the combustion chamber. The ignition device may be at least partially disposed within the housing assembly and may ignite fuel received from a fuel source and air received from the airflow passage to produce a flame in the combustion chamber. The airflow passage may be in a heat transfer relationship with the flame in the combustion chamber.

The present invention relates to a residual gas burner (13) for a fuel cell system (1) having to educt gas feeds (11, 12) for feeding an educt gas each to a combustion chamber (14) of the residual gas burner (13). An improved operation of the residual gas burner (13) is obtained when the educt gas feeds (11, 12) each comprise outlet openings (22, 27), wherein the outlet openings (22, 27) face the combustion chamber (14) and the outlet openings (22, 27) of one of the educt gas feeds (11, 12) face a first bottom surface (29) of the other educt gas feed (11, 12). In addition, the invention relates to a fuel cell system (1) having such a residual gas burner (13).

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.

A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.

Improved fidelity to an integrated circuit pattern design in a semiconductor structure ultimately produced is achieved by modeling material removal and deposition processes in regard to materials, reactant, feature size, feature density, process parameters and the like as well as the effects of such parameters on etch and material deposition bias due to microloading and RIE lag (including inverse RIE lag) and using the models to work backward through the intended manufacturing method steps, including hard mask pattern decomposition, to morphologically develop feature patterns for use in most or all process steps which will result in the desired feature sizes and shapes at the completion of the overall process. Modeling of processes may be simplified through use of process assist features to locally adjust rates of material deposition and removal.

Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material may be formed by spin-casting a conformal layer of the first material across the features, or by selective deposition along the features relative to the substrate. After the first material is formed, fill material may be provided between the features while leaving regions of the first material exposed. The exposed regions of the first material may then be selectively removed relative to both the fill material and the features to create the pattern of openings.

The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and using a fluoropolymer to protect regions of said electronic or photonic material during a patterning process.

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.

An additive polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OR2)—R3 group (wherein R2 is H, acyl or acid labile group, R3 is H, CH3 or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes, a plurality of first assist features for restricting pattern distortion of the first dummy contact holes disposed inside a corresponding one of the first dummy contact holes, and an array of second assist features for additionally restricting pattern distortion of the first dummy contact holes. The array of second assist features is disposed outside of the first dummy contact holes. The method also includes forming an array of contact holes and first dummy contact holes on a wafer by using the photomask as an exposure mask.

Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

A harness attachment to shoulder strap harness for holding a guitar in the front of the player which is attached to the left fret end and right strumming end of the guitar. The present invention has an additional right srumming end attachment which mounts over the right strumming end attachment of the shoulder strap harness. The attachment of the present invention includes a lower mounting member and an upper adjustable loop member movably attachable to the player's right hip area in a number of embodiments.

Systems and methods for implementing FlexRay communications between FlexRay nodes using Ethernet are provided. An Ethernet switch includes ports, each of which receives an Ethernet data packet (EDP) from a respective FlexRay node. Each EDP includes a FlexRay message, which includes at least one of a data frame and a frame identification (ID). A first EDP is received at a first port no later than a second EDP is received at a second port. The Ethernet switch also includes a controller module that determines whether the second EDP has higher priority than the first EDP based on the frame IDs associated with the first and second EDPs. The controller module is configured to route the second EDP to a second destination no later than routing the first EDP to a first destination and meet FlexRay transmission cycle times when it has been determined that the second EDP has higher priority.

A multi-participant conference system and method is described. The multi-participant system includes a PSTN client, at least one remote client and a first participant client. The PSTN client communicates audio data and the remote clients communicate audio-video data. The first participant client includes a voice over IP (VoIP) encoder, a VoIP decoder, a first audio mixer, and a second audio mixer. The VoIP encoder compresses audio data transported to the PSTN client. The VoIP decoder then decodes audio data from the PSTN client. The first audio mixer mixes the decoded audio data from the PSTN client with the audio-video data from the first participant into a first mixed audio-video data stream transmitted to the remote client. The second audio mixer mixes the audio-video data stream from the first participant with the audio-video data stream from each remote client into a second mixed audio transmitted to the PSTN client.

A secondary assembly drive of an internal combustion engine and a method for operating same are provided. The secondary assembly drive includes: a first drive wheel (1) which can be rotatably connected to a crank shaft (CR) of the internal combustion engine, an electric machine which can be operated either as a generator (AL) of as a motor (M) and a second drive wheel (2) which can be rotatably connected to the electric machine (AL, M), an air-conditioning compressor (A/C) and a third drive wheel (3) which can be rotatably connected to the air-conditioning compressor, a traction element (4) which rotates infinitely and which wraps around the drive wheels, and an actuable clutch (7) for disconnecting the drive of the electric machine and of the air-conditioning compressor from the crankshaft when necessary. In addition, the air-conditioning compressor is designed for operation in both rotational directions, and a reversal of the rotational direction between the generator operating mode and the motor operating mode of the electric machine is provided.

A secondary assembly drive of an internal combustion engine and a method for operating same are provided. The secondary assembly drive includes, in two drive planes, an assembly drive (2) and a starter drive (12) and permits, in addition to a normal operating mode, the following operating modes: —starting of the internal combustion engine, —boosting of the internal combustion engine, —air-conditioning, and —deactivation of the assembly drive (2).

The present invention provides an inbred corn line designated DC4016YD, methods for producing a corn plant by crossing plants of the inbred line DC4016YD with plants of another corn plant. The invention further encompasses all parts of inbred corn line DC4016YD, including culturable cells. Additionally provided herein are methods for introducing transgenes into inbred corn line DC4016YD, and plants produced according to these methods.

The present invention provides an inbred corn line designated HID3483, methods for producing a corn plant by crossing plants of the inbred line HID3483 with plants of another corn plant. The invention further encompasses all parts of inbred corn line HID3483, including culturable cells. Additionally provided herein are methods for introducing transgenes into inbred corn line HID3483, and plants produced according to these methods.

The present invention provides an inbred corn line designated KLI6131, methods for producing a corn plant by crossing plants of the inbred line KLI6131 with plants of another corn plant. The invention further encompasses all parts of inbred corn line KLI6131, including culturable cells. Additionally provided herein are methods for introducing transgenes into inbred corn line KLI6131, and plants produced according to these methods.

The present invention provides an inbred corn line designated KDL6289, methods for producing a corn plant by crossing plants of the inbred line KDL6289 with plants of another corn plant. The invention further encompasses all parts of inbred corn line KDL6289, including culturable cells. Additionally provided herein are methods for introducing transgenes into inbred corn line KDL6289, and plants produced according to these methods.

According to the invention, there is provided seed and plants of the corn variety designated CV052803. The invention thus relates to the plants, seeds and tissue cultures of the variety CV052803, and to methods for producing a corn plant produced by crossing a corn plant of variety CV052803 with itself or with another corn plant, such as a plant of another variety. The invention further relates to corn seeds and plants produced by crossing plants of variety CV052803 with plants of another variety, such as another inbred line. The invention further relates to the inbred and hybrid genetic complements of plants of variety CV052803.

According to the invention, there is provided seed and plants of the hybrid corn variety designated CH715413. The invention thus relates to the plants, seeds and tissue cultures of the variety CH715413, and to methods for producing a corn plant produced by crossing a corn plant of variety CH715413 with itself or with another corn plant, such as a plant of another variety. The invention further relates to genetic complements of plants of variety CH715413.

The present invention provides an inbred corn line designated FX8609, methods for producing a corn plant by crossing plants of the inbred line FX8609 with plants of another corn plant. The invention further encompasses all parts of inbred corn line FX8609, including culturable cells. Additionally provided herein are methods for introducing transgenes into inbred corn line FX8609, and plants produced according to these methods.

The present invention provides an inbred corn line designated MFX7589, methods for producing a corn plant by crossing plants of the inbred line MFX7589 with plants of another corn plant. The invention further encompasses all parts of inbred corn line MFX7589, including culturable cells. Additionally provided herein are methods for introducing transgenes into inbred corn line MFX7589, and plants produced according to these methods.

A mixing rotor includes: a rotor shaft portion that includes a cooling passageway formed therein, and a mixing blade portion that is formed in an outer circumferential portion of the rotor shaft portion, wherein each of the long blades of the mixing blade portion includes a land portion as an end surface of the long blade facing a radially outside of the mixing rotor, a length of each of the long blades in the axis direction is set to be 0.6 times or more as large as a length of the mixing blade portion in the axis direction, a biting angle of each of the long blades is set to an angle equal to or smaller than 31°, and a center angle with respect to a land width as a width of the land portion in the cross-section of each of the long blades orthogonal to the axis direction is set to an angle equal to or larger than 7°.

Many GTPases such as Ras, Ral and Rho require post-translational farnestylation or geranylgeranylation for mediating malignant transformation. Dual farnesyltransferase (FT) (FTI) and geranylgeranyltransferase-I (GGT-1) inhibitors (GGTI) were developed as anticancer agents from based on an ethylenediamine scaffold. On the basis of a 4-fold substituted ethylenediamine scaffold, the inhibitors are structurally simple and readily derivatized, facilitating extensive structure-activity relationship studies. The most potent inhibitor is compound exhibited an in vitro hFTase IC50 value of 25 nM and a whole cell H-Ras processing IC50 value of 90 nM. Several of the inhibitors proved highly selective for hFTase over the related prenyltransferase enzyme geranylgeranyltransferase-I (GGTase-I). A crystal structure of an inhibitor cocrystallized with farnesyl pyrophosphate in the active site of rat FTase illustrates that the para-benzonitrile moiety is stabilized by a π-π stacking interaction with the Y361β residue, suggesting an importance of this component of the inhibitors.

The lubricating base oil of the invention is characterized by satisfying at least one of the following conditions (a) or (b). (a) A saturated compound content of 95% by mass or greater, and a proportion of 0.1-10% by mass of cyclic saturated compounds among the saturated compounds.(b) The condition represented by the following formula (1). 1.435≦n20−0.002×kv100≦1.450 (1) wherein n20 represents the refractive index of the lubricating base oil at 20° C., and kv100 represents the kinematic viscosity (mm2/s) of the lubricating base oil at 100° C.

There is provided an automatic tool changer which, in a precision roll turning lathe which feeds a tool post at a high speed, can automatically change a tool, such as a cutting tool, without stopping the machine, thereby enabling highly efficient ultra-Precision machining of a roll mold for molding of a large-sized plastic sheet. The automatic tool changer includes: a change device including a vertically movable pivot arm having a pivot axis and which pivots in a horizontal plane, a hand portion, mounted at the front end of the arm, for detachably gripping a tool holder, a pivot drive section for pivoting the pivot arm, and a lifting drive section for vertically moving the pivot arm; a tool holder stocker, having a plurality of circumferentially-arranged stages disposed at a predetermined distance from the pivot axis, each stage detachably holding a tool holder; a holder base, mounted to the tool post, for fixing and unfixing a tool holder through the rotation of a clamp shaft; and a clamp shaft operating device including an operating portion for clamping/unclamping the tool holder by rotating the clamp shaft.

A carriage is moved in a direction including a Y axis component in order to move a turning process tool that is attached to a tool spindle along a horizontal line that is perpendicular to a Z axis, and thus, a turning process is carried out on a workpiece which is attached to a workpiece spindle.

A toolholder assembly includes a toolholder body having a coolant passage and a cutting insert seated within a recess of the body. The cutting insert includes an insert orifice extending between a top face and a bottom face that aligns with the coolant passage. A lock pin includes a lock pin orifice that aligns with and is in fluid communication with the coolant passage of the body. The lock pin orifice has an outlet port to allow the fluid to flow through the lock pin orifice and exit through the outlet port. A lock pin ring includes a coolant port in fluid communication with the outlet port of the lock pin to effectively discharge cooling fluid in the direction of a cutting area of the cutting insert.

A laminated body composed of a holding member and an inner cylinder is arranged between a heat generation element, which is electrically energized to generate heat, and a case which covers the heat generation element, and the inner cylinder has an upstream side end portion extended to a more upstream side than an upstream side end face of said heat generation element and an upstream side end face of said holding member to form an extension portion, which is formed with a protruding portion protruding to an inner side in a diametrical direction. A flow of an exhaust gas, which flows backwards after colliding with the heat generation element, will be obstructed by said protruding portion. As a result, the backflow exhaust gas stops flowing into a gap between the case and the inner cylinder.