ilm

Dielectric thin film-forming composition, method of forming dielectric thin film and dielectric thin film formed by the method

A liquid composition is provided for forming a thin film in the form of a mixed composite metal oxide in which a composite oxide B containing copper (Cu) and a composite oxide C containing manganese (Mn) are mixed into a composite metal oxide A represented with the general formula: Ba1-xSrxTiyO3, wherein the molar ratio B/A of the composite oxide B to the composite metal oxide A is within the range of 0.002




ilm

Thick film silver paste and its use in the manufacture of semiconductor devices

The present invention is directed to an electroconductive silver thick film paste composition comprising Ag, a glass frit and rhodium resinate, Cr2O3 or a mixture thereof all dispersed in an organic medium. The present invention is further directed to an electrode formed from the paste composition and a semiconductor device and, in particular, a solar cell comprising such an electrode. The paste is particularly useful for forming a tabbing electrode.




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Nanostructured thermoplastic polyimide films

Structured films containing multi-walled carbon nanotubes (“MWCNTs”) have enhanced mechanical performance in terms of strength, fracture resistance, and creep recovery of polyimide (“PI”) films. Preferably, the loadings of MWCNTs can be in the range of 0.1 wt % to 0.5 wt %. The strength of the new PI films dried at 60° C. increased by 55% and 72% for 0.1 wt % MWCNT and 0.5 wt % MWCNT loadings, respectively, while the fracture resistance increased by 23% for the 0.1 wt % MWCNTs and then decreases at a loading of 0.5 wt % MWCNTs. The films can be advantageously be created by managing a corresponding shift in the annealing temperature at which the maximum strength occurs as the MWCNT loadings increase.




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Adhesive composition, varnish, adhesive film and wiring film

Provided are an adhesive composition with good storage stability, heat resistance, moisture resistance reliability, and adhesion properties; and a curl- and heat-resistant adhesive film and a wiring film using the adhesive composition. The adhesive composition contains 100 parts by weight of a phenoxy resin (A) having plural alcoholic hydroxyl groups in a side chain of the molecule thereof; 2 to 60 parts by weight of a polyfunctional isocyanate compound (B) having an isocyanate group and at least one functional group selected from vinyl, acrylate, and methacrylate groups in the molecule thereof; and 5 to 30 parts by weight of a maleimide compound (C) having plural maleimide groups in the molecule thereof or/and reaction product thereof, in which a total amount of the components (B) and (C) is from 7 to 60 parts by weight.




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Thermosetting adhesive composition, and heat resistant adhesive film and wiring film using the same

Provided are a thermosetting adhesive composition excellent in storage stability, reliability, and low-temperature adhesion properties; and a curl-resistant heat-resistant film and a wiring film obtained using the composition. The thermosetting adhesive composition includes 100 parts by weight of a phenoxy resin having a bisphenol S skeleton in the structure thereof; 5 to 30 parts by weight of a maleimide compound containing a plurality of maleimide groups in the structure thereof; and 3 to 20 vol % of an inorganic needle-like filler. The heat resistant adhesive film is obtained by applying the thermosetting adhesive composition onto a polyimide film, followed by drying. The wiring film is obtained by placing a conductor wiring layer on the heat resistant adhesive film.




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UV-curable coating compositions with self-healing capabilities, coating films, and methods of producing coating films

The present invention is directed to a coating composition including a (meth)acrylate binder resin, a UV initiator, an organic solvent, and silica particles surface-treated with a (meth)acrylate compound, a coating film including a cured product of the coating composition, and a method of producing the coating film. The present invention makes it possible to provide a coating material having high transmittance and a low level of haze, and excellent scratch resistance and self-healing capabilities.




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Fragranced water-sensitive film

A film formed from a water-soluble polymer matrix within which is contained at least one fragrance is provided. The film is water-sensitive (e.g., water-soluble, water-dispersible, etc.) so that upon contact with a sufficient amount of water, the polymer matrix loses its integrity over time to increasingly expose the fragrance to the ambient environment for releasing its odor. The ability to incorporate a fragrance into the polymer matrix is achieved in the present invention by controlling a variety of aspects of the film construction, including the nature of the fragrance, the nature of the water-soluble polymer, the manner in which the polymer matrix and fragrance are melt processed, etc. For example, the fragrance may be injected directly into the extruder and melt blended with the water-soluble polymer. In this manner, the costly and time-consuming steps of pre-encapsulation or pre-compounding of the fragrance into a masterbatch are not required. Furthermore, to obtain a balance between the ability of the fragrance to release the desired odor during use and likewise to minimize the premature exhaustion of the odor during melt processing, the fragrance is selected to have a boiling point (at atmospheric pressure) within a certain range, such as from about 125° C. to about 350° C.




ilm

Compositions and methods for treating biofilms

Compositions and methods for treating biofilm formation and growth on a substrate are provided. The composition comprises 1 ppb to 1,000 ppm of at least one D-amino acid and 1 ppm to 60,000 ppm of at least one biocide. The method comprises contacting the substrate with 1 ppb to 1,000 ppm of at least one D-amino acid and 1 ppm to 60,000 ppm of at least one biocide. The compositions and methods are effective for preventing, reducing or eliminating biofilm formation or biofilm growth or both, as well as eradicating established, recalcitrant biofilms, particularly biofilms comprising sulfate reducing bacteria that are known to cause microbiologically influenced corrosion, biofouling, or both.




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Superconducting rotating electrical machine and manufacturing method for high temperature superconducting film thereof

The present disclosure relates to a superconducting rotating electrical machine and a manufacturing method for a high temperature superconducting film thereof. The superconducting rotating electrical machine includes a stator, and a rotor rotatable with respect to the stator, the rotor having a rotary shaft and a rotor winding. Here, the rotor winding includes tubes disposed on a circumference of the rotary shaft and each forming a passage for a cooling fluid therein, superconducting wires accommodated within the tubes, and a cooling fluid flowing through the inside of the tubes. This configuration may allow for direct heat exchange between the superconducting wires and a refrigerant, resulting in improvement of heat exchange efficiencies of the superconducting wires.




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Superconducting film-forming substrate, superconducting wire, and superconducting wire manufacturing method

A tape-shaped superconducting film-forming substrate is disclosed, which includes a film-forming face for forming a laminate including a superconducting layer thereon, a rear face that is a face at a side opposite to the film-forming face, a pair of end faces connected to the film-forming face and the rear face, and a pair of side faces connected to the film-forming face, the rear face, and the pair of end faces, in which each of the pair of side faces includes a spreading face that spreads toward an outer side in an in-plane direction of the film-forming face from an edge part of the film-forming face toward the rear face side. A superconducting wire and a superconducting wire manufacturing method are also disclosed.




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Oxide superconductor, oriented oxide thin film, and method for manufacturing oxide superconductor

According to one embodiment, an oxide superconductor includes an oriented superconductor layer and an oxide layer. The oriented superconductor layer contains fluorine at 2.0×1016-5.0×1019 atoms/cc and carbon at 1.0×1018-5.0×1020 atoms/cc. The superconductor layer contains in 90% or more a portion oriented along c-axis with an in-plane orientation degree (Δφ) of 10 degrees or less, and contains a LnBa2Cu3O7-x superconductor material (Ln being yttrium or a lanthanoid except cerium, praseodymium, promethium, and lutetium). The oxide layer is provided in contact with a lower surface of the superconductor layer and oriented with an in-plane orientation degree (Δφ) of 10 degrees or less with respect to one crystal axis of the superconductor layer. Area of a portion of the lower surface of the superconductor layer in contact with the oxide layer is 0.3 or less of area of a region directly below the superconductor layer.




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Superconducting thin film material and method of manufacturing same

A superconducting thin film material exhibiting excellent superconducting properties and a method of manufacturing the same are provided. A superconducting thin film material includes a substrate, and a superconducting film formed on the substrate. The superconducting film includes an MOD layer formed by an MOD process, and a gas-phase-formed layer formed on the MOD layer by a gas-phase process. Since the MOD layer is formed first and then the gas-phase-formed layer is formed in this manner, degradation of the properties of the gas-phase-formed layer due to heat treatment in the step of forming the MOD layer (heat treatment in the MOD process) can be prevented.




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Polycyclic organic compound, optically anisotropic film and method of production thereof

The polycyclic organic compounds which are substantially transparent for an electromagnetic radiation in the visible spectral range, an anisotropic optical film comprising at least one polycyclic organic compound and a method of producing thereof are disclosed. The polycyclic organic compounds have a general formula (I) wherein A and B are acid groups, n is the number of phenyl rings in the range from 3 to 10; m is 0, 1, 2 or 3; l is 1, 2, or 3, p is 1, 2, 3, 4, 5 or 6, C is a counterion from a list comprising H+, NH+4, Na+, K+, Li+, Cs+, Ca2+, Mg2+, Sr2+, La3+, Zn2+, Zr4+, Ce3+, Y3+, Yb3+, Gd3+, and any combination thereof; k is the number of counterions necessary for compensation of the negative electric charge equal to (−p).




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Method of manufacturing water repellent film and thereby manufactured water repellent film

A method of manufacturing a water repellent film includes, before a formation step of forming an organic film on a substrate using a silane coupling agent by a vapor phase deposition method under film formation conditions, a step of specifying the film formation conditions using a test substrate of a same material as the substrate used in the formation step. The film formation condition specifying step includes: specifying film formation temperature to be not lower than a temperature at which the silane coupling agent evaporates and to be lower than a temperature at which the silane coupling agent bumps; and forming an organic film of the silane coupling agent on the test substrate at the specified film formation temperature, measuring by optical microscopic observation a time at which a bead of surplus water repellent material is formed, and specifying the film formation duration to be shorter than the measured time.




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Coating composition for low refractive layer including fluorine-containing compound, anti-reflection film using the same, polarizer and image display device including the same

Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.




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High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films

A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein R1 and R2 are independently C2-C8-alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.




ilm

Bismuth-thiols as antiseptics for biomedical uses, including treatment of bacterial biofilms and other uses

Compositions and methods, including novel homogeneous microparticulate suspensions, are described for treating natural surfaces that contain bacterial biofilm, including unexpected synergy or enhancing effects between bismuth-thiol (BT) compounds and certain antibiotics, to provide formulations including antiseptic formulations. Previously unpredicted antibacterial properties and anti-biofilm properties of disclosed BT compounds and BT compound-plus-antibiotic combinations are also described, including preferential efficacies of certain such compositions for treating certain gram-positive bacterial infections, and distinct preferential efficacies of certain such compositions for treating certain gram-negative bacterial infections.




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Photosensitive resin composition for insulating film of display device, insulating film using the same, and display device using the same

A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (D) a solvent. An insulating film and a display device can include the photosensitive resin composition.




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Hard coat film, polarizer and image display device

Provided is a hard coat film having high hardness and excellent restorability in view of the above circumstances. A hard coat film comprising: a light-transmitting substrate; and a hard coat layer, the hard coat layer comprising a cured product of a composition for a hard coat layer, the composition including an isocyanuric skeleton-containing urethane(meth)acrylate.




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Pressure-sensitive adhesive for polarizing plates, pressure-sensitive adhesive sheet, polarizing plate with pressure-sensitive adhesive and production process for the same and optical film and production process for the same

Provided is a pressure-sensitive adhesive for polarizing plates which can adhere a polarizing plate on a liquid crystal cell with good adhesion durability and has the characteristic that a liquid crystal display device obtained therefrom is less liable to cause light leakage even under the environment of high temperature and high humidity and which makes it possible remove the polarizing plate. The pressure-sensitive adhesive for polarizing plates is prepared by irradiating a pressure-sensitive adhesive material comprising (A) an acrylic base polymer having a weight average molecular weight of 1,000,000 or more comprising a monomer having a hydroxyl group in a monomer composition ratio of 10 mass % or less, (B) an acrylic base polymer having a weight average molecular weight of 1,000,000 or more comprising a monomer having a carboxyl group in a monomer composition ratio of 10 mass % or less and (C) an active energy beam-curable compound with an active energy beam, wherein a mass ratio of the component (A) to the component (B) is 100:1 to 100:50, and a storage elastic modulus (G') at 23° C. is 0.3 MPa or more.




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Weather resistant exterior film composite

This invention relates to film composites with a single coating of hard coat material which have a significant improved adhesion together with improved weather resistance while also increasing resistance to abrasion and cracking. In one embodiment, this film composite is comprised of a transparent base sheet having on one side thereof a weather resistant hard coat comprised of: at least one multifunctional acrylate monomer or oligomer; a dual-curable resin comprising an aliphatic urethane acrylate resin having isocyanate functional groups and an aliphatic urethane acrylate having hydroxyl functional groups; an ultraviolet (UV) stabilizer; and a photoinitiator.




ilm

Laser imageable polyolefin film

The presently disclosed subject matter is directed generally to a polymeric film that comprises at least one laser imageable marking layer. The marking layer comprises a polyolefin, a photochromatic pigment, and an additive. It has been surprisingly discovered that a polyolefin film comprising a marking layer formulated with a photochromatic pigment and an additive offers a substantial advantage over prior art methods of laser imaging polyolefin films.




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Coating composition, a film containing the same, and a method for forming a sealable film

A coating composition comprising: an aqueous dispersion comprising: the melt-kneading product of (A) a base polymer which comprises one or more thermoplastic polymers, (B) a stabilizing agent which comprises at least one component selected from the group consisting of acrylic acid grafted ethylene-based polymers and maleic anhydride grafted polyolefins; (C) a neutralizing agent; and (D) water; wherein the aqueous dispersion has a volume average particle size of less than about 5 μm is provided.




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Atomic layer deposition of metal sulfide thin films using non-halogenated precursors

A method for preparing a metal sulfide thin film using ALD and structures incorporating the metal sulfide thin film. The method includes providing an ALD reactor, a substrate, a first precursor comprising a metal and a second precursor comprising a sulfur compound. The first and the second precursors are reacted in the ALD precursor to form a metal sulfide thin film on the substrate. In a particular embodiment, the metal compound comprises Bis(N,N'-di-sec-butylacetamidinato)dicopper(I) and the sulfur compound comprises hydrogen sulfide (H2S) to prepare a Cu2S film. The resulting metal sulfide thin film may be used in among other devices, photovoltaic devices, including interdigitated photovoltaic devices that may use relatively abundant materials for electrical energy production.




ilm

Method of manufacturing silver miniwire films

A method of manufacturing a silver miniwire film is provided, wherein the film exhibits a reduced sheet resistance.




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Method for producing transparent conductive film, transparent conductive film, transparent conductive substrate and device comprising the same

Provided is a method for producing a transparent conductive film which is formed via a coating step, a drying step and a baking step, wherein the baking step is characterized in that the dried coating film containing the organic metal compound as the main component is baked by being heated to a baking temperature or higher, at which at least the inorganic component is crystallized, under an oxygen-containing atmosphere having a dewpoint of −10° C. or lower, whereby an organic component contained in the dried coating film is removed therefrom by a heat decomposition, a combustion or the combination thereof to thereby form a conductive oxide microparticle layer densely filled with conductive oxide microparticles containing the metal oxide as a main component.




ilm

Inorganic nanocoating primed organic film

An inorganic nanolayer surface coated polymer film product is disclosed with enhancements such as improved metallization capability, low cost, low polymer additives and modifiers, improved recyclability, and good web properties. Also method for priming a flexible film substrate to enhance the reactivity or wettability of the substrate for metallization is disclosed. A substrate film is coated with one or more nanolayers of a metal or metal oxide applied by CCVD and/or PECVD at open atmosphere. The deposited coating acts to enhance the surface energy of the film substrate and to and reduce the surface gauge variation of the substrate or supporting film, thereby enhancing the wettability of the film substrate for metallization and/or to improve the anti-block characteristics of the film. The deposited coatings may also act as a barrier layer for lowering the permeability of light, gas and vapor transmission through the substrate.




ilm

Using chemical vapor deposited films to control domain orientation in block copolymer thin films

Vacuum deposited thin films of material are described to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.




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Fabrication of zeolite composite film

A fabrication of a zeolite composite film includes mixing a composition of water, aluminum isopropoxide, TMAOH, and TEOS according to a set ratio, followed by stirring and heating to obtain a mixture; performing a centrifugation on the mixture to obtain an upper layer suspension; preparing a mesoporous particle suspension that includes a plurality of mesoporous particles, and each mesoporous particle includes a plurality of templating agents; vaporizing a mixture suspension formed from both the upper layer suspension and the mesoporous particle suspension to form a plurality of vaporized droplets; depositing the vaporized droplets on a heated substrate while removing the templating agents to form the zeolite composite film with a plurality of macroporous, mesoporous and microporous structures.




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Thin-film manufacturing method and apparatus

A thin-film manufacturing method includes the steps of: generating a plasma from source gas; extracting ions from the plasma; and depositing a thin film on one side or both sides of a substrate to be deposited with the ions. The method is performed in an apparatus including: a plasma chamber generating the plasma; a film deposition chamber accommodating the substrate to be deposited; an ion transfer path for transferring the ions from the plasma chamber to the film deposition chamber; a branch pipe branching from the ion transfer path; and an exhaust system connected to the branch pipe. The thin film is formed while the source gas except the ions is exhausted from the branch pipe.




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Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.




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Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film

Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.




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***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.




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Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer film

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.




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Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.




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Blasting method and apparatus having abrasive recovery system, processing method of thin-film solar cell panel, and thin-film solar cell panel processed by the method

Particularly, a thin-film solar cell panel or the like is processed without necessity of attaching and detaching of mask and washing steps with respect to a workpiece in a fine blasting employing a fine abrasive. A negative pressure space (20) and an opposing negative pressure space (40) having openings (22, 42) are opposed by being spaced at a movement allowable interval of the workpiece such as a thin-film solar cell panel or the like and so as to face one side edge in the same direction as a moving direction of the workpiece. Further, a fine abrasive is injected while relatively moving the workpiece in a moving direction (T) with respect to a blast gun (30) in which an injection hole (31) is disposed within the negative pressure space (20), and the fine abrasive injected into the negative pressure space (20) and/or the opposing negative pressure space (40) and a cut and removed cut scrap such as a thin film layer or the like are sucked and recovered through the intermediary of suction devices (21a, 21b) and/or an opposing suction device (41) respectively communicating with the spaces (20) and/or (40).




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Film dressing with improved application assistance

A film structure having a polymer film and an application system enabling the film structure to be handled in a simple manner. The application system is arranged on a first side of the polymer film and has at least one supporting film to which at least one gripping strip is applied. The polymer film also has at least one first region without a supporting film.




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Alkali earth metal precursors for depositing calcium and strontium containing films

Methods and compositions for the deposition of a film on a substrate. In general, the disclosed compositions and methods utilize a precursor containing calcium or strontium.




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Light absorption anisotropic film, polarizing film, process for producing the polarizing film and display device using the polarizing film

A light absorption anisotropic film, wherein content of a liquid crystalline non-colorable low molecular weight compound is 30% by mass or less; and which is obtained by fixing the alignment of a dichroic dye composition comprising at least one type of azo-based dichroic dye having nematic liquid crystallinity; and shows a diffraction peak derived from a periodic structure in a direction parallel to the alignment axis on measurement of X-ray diffraction. The light absorption anisotropic film is high in dichroism.




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(Amide amino alkane) metal compound, method of manufacturing metal-containing thin film using said metal compound

The present invention relates to an (amide amino alkane) metal compound represented by the formula (1): wherein M represents a metal atom;R1 represents a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms;R2 and R3 may be the same as, or different from each other, and each independently represents a linear or branched alkyl group having 1 to 3 carbon atoms, or R2 and R3 may form a substituted or unsubstituted 5- or 6-membered ring together with the nitrogen atom to which they are bound;Z represents a linear or branched alkylene group having 1 to 10 carbon atoms (a part of which may optionally form a ring); andn represents a number of the ligands, which is equal to the valence of the metal (M), and represents an integer of from 1 to 3; with the proviso that the metal compounds in which M is Li (Lithium), Be (Beryllium), Ge (Germanium) or Nd (Neodymium) are excluded;the metal compounds in which M is Mg (Magnesium) and R1 is methyl group are excluded;the metal compounds in which M is Zn (Zinc) and R1 is methyl group are excluded;the metal compounds in which M is Bi (Bismuth) and R1 is t-butyl group are excluded; andin cases where n is two or greater, two or more ligands may be the same as, or different from each other; and a method of producing a metal-containing thin film using the metal compound.




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Dichroic dye composition, light absorption anisotropic film, and polarizing element

A light absorption anisotropic film, having at least one dichroic dye, in which the light absorption anisotropic film shows a diffraction peak derived from a periodic structure in a direction in a plane of the light absorption anisotropic film in X-ray diffraction measurement and the diffraction peak has a half width of 1.0 Å or less.




ilm

Azo compound and dye polarizing film containing the same

Disclosed is an azo compound represented by the formula (1) below, a salt thereof, or a copper complex salt compound thereof. (In the formula, R1 and R2 independently represent a hydrogen atom, a sulfonic acid group, a lower alkyl group or a lower alkoxyl group; R3-R6 independently represent a hydrogen atom, a lower alkyl group or a lower alkoxyl group; R7 represents a lower alkyl group or a lower alkoxyl group; and n represents 0 or 1.)




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Liquid-crystal compound, liquid-crystal composition, light absorption anisotropic film, and liquid-crystal display device

A liquid-crystal compound denoted by general formula (I) below wherein each of the groups is defined and Dye denotes an azo dye residue denoted by general formula (II) with X and n also being defined. The azo liquid-crystal compound is capable of orientation with a high degree of orientation order.




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Pressure sensitive adhesive composition for protective film having anti-static property and manufacturing process thereof

Provided is an adhesive composition for a protective film including an acrylic emulsion resin capable of providing contamination resistance on the film and low peel strength and minimizing generation of static electricity during peeling of the protective film. The acrylic emulsion resin includes a mixture including 80 to 99.9% by weight of a polymer of a (meth)acrylic acid ester monomer including a C1-C14 alkyl group and a (meth)acrylic acid ester monomer including an alkylene oxide unit, and 0.1 to 20% by weight of a monomer including a carboxyl group and/or a hydroxyl group or a combination thereof, and 5 to 30 parts by weight of a reactive emulsifier having a double bond structure radical-polymerizable with the polymer and including an alkylene oxide unit based on 100 parts by weight of the mixture.




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Films matted on one side and the use thereof

The invention relates to multi-layer elastic thermoplastic films, which consist of at least one layer of thermoplastic polyurethane (TPE-U), at least one further layer of thermoplastic polyurethane which is blended with modified acrylonitrile-butadiene-styrene copolymer (MABS), and optionally at least one support layer of thermoplastic polymer which is incompatible with TPE-U, and to the use thereof.




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Solar cell sealing film and solar cell

A solar cell sealing film contains an ethylene-unsaturated ester copolymer, a crosslinker, and crosslinking auxiliary agents, wherein the solar cell sealing film contains a polyfunctional (meth)acrylate having 5 or more (meth)acryloyl groups in the molecule and triallyl isocyanurate as the crosslinking auxiliary agents, and a mass ratio of the polyfunctional (meth)acrylate to the triallyl isocyanurate is 0.06 to 0.3 parts of polyfunctional (meth)acrylate per 1 part of triallyl isocyanurate.




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Perpendicular magnetic recording disk with multiple magnetic layers and intermediate dual nucleation films for control of grain size

A perpendicular magnetic recording disk has a graded-anisotropy recording layer (RL) formed of at least two ferromagnetically exchange coupled CoPtCr-oxide magnetic layers (MAG1 and MAG2) with two nucleation films (NF1 and NF2) between the magnetic layers. NF1 is a metal film, preferably Ru or a Ru-based alloy like RuCr, sputter deposited on MAG1 at low pressure to a thickness between about 0.1-1.5 nm. NF2 is a metal oxide film, preferably an oxide of Ta, sputter deposited on NF1 at high pressure to a thickness between about 0.2-1.0 nm. MAG2 is sputter deposited over NF2. NF1 and NF2 provide a significant reduction in average grain size in the RL from a graded-anisotropy RL without nucleation films between MAG1 and MAG2, while also assuring that MAG1 and MAG2 are strongly exchange coupled.




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Optical film, method of producing optical film, antireflective film, polarizing plate and image display device

An optical film has a cellulose acylate film base material containing cellulose acylate and a plurality of sugar ester compounds having different ester substitution degrees in which an average ester substitution degree of the plurality of sugar ester compounds is from 60 to 94%, and an antistatic hardcoat layer formed from a coating composition containing at least an organic antistatic agent and a curable compound having a (meth)acryloyl group in a molecule of the curable compound.




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Printed flexible film for food packaging

The printed image on a major face of a flexible food packaging film is covered by a shellac barrier coating.




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Heat-assisted magnetic recording (HAMR) write head with recessed near-field transducer and optically transparent protective film

A heat-assisted magnetic recording (HAMR) air-bearing slider has an optically-transparent protective film over the near-field transducer (NFT) to protect the NFT from excessive heat caused by the accumulation of carbonaceous material on the slider's overcoat. The NFT is thus separated from the overcoat by the protective film. The protective film does not cover the write pole end, which is covered only by the overcoat, so there is no spacing loss between the write pole end and the recording layer on the disk. In one embodiment the protective film is coplanar with the recording-layer-facing surface of the slider and the overcoat covers both the protective film and the write pole end. In another embodiment the overcoat has a window that surrounds the protective film, with the protective film being substantially coplanar with the air-bearing surface (ABS) of the slider. In both embodiments the smooth topography of the slider's ABS is maintained.