A process and a unit for fluidized bed torrefaction and grinding of particles of a biomass with a largest dimension of 2 cm to 5 cm, and which unit contains an envelope having a general shape of a sector having a) two substantially vertical walls delimiting that sector; and b) at least one inclined wall defining three zones, from bottom to top: a lower zone provided with a fluidization means, and provided with a grinder placed at the bottom of that zone; an intermediate zone (2) provided with a fluidization means; and an upper zone (3) provided with a fluidization means; and a pipe (11) for introducing the particles reaching into the unit to the level of the intermediate zone.

A method for preparing a lenticular guide roll for use in a lenticular printing run. The method comprises providing a printing roll of a printing press and a first piece of lenticular media. The first piece of lenticular printing substrate has a pitch which is substantially identical to a second lenticular printing substrate to be used in the lenticular printing run. The, method further comprises attaching the first piece of lenticular printing substrate to the printing roll to allow the maneuvering of the second lenticular printing substrate by the printing roll in the printing press.

Methods and structures are disclosed to minimize the presence of vapor clouding in the path between an energy (e.g., radiation) source and the dampening fluid layer in a variable data lithography system. Also disclosed are conditions for optimizing vaporization of regions of the dampening fluid layer for a given laser source power. Conditions are also disclosed for minimizing re-condensation of vaporized dampening fluid onto the patterned dampening fluid layer. Accordingly, a reduction in the power required for, and an increase in the reproducibility of, patterning of a dampening fluid layer over a reimageable surface in a variable data lithography system are disclosed.

In one example, a device for use in a printer includes a flexible piece and a holder configured to removably attach the piece to a platen that has a surface over which a print substrate is moved through the print zone for printing on the substrate. The piece and the holder are configured to place the piece in tension along the platen surface such that, when the piece is attached to the platen, the piece becomes sufficiently rigid to counter substrate edge curl.

A contact printing system is disclosed. A gravure cylinder having a plurality of discrete cells having an aspect ratio of at least about 25:1 disposed upon an outer surface thereof. A first portion of a first fluid and a second portion of a second fluid are disposed from a respective channel disposed internal to the gravure cylinder.

A partition subset selection module selects a subset of available partitions for a macroblock pair of the plurality of macroblock pairs, based on motion search motion vectors generated by a motion search section, and further based on a macroblock adaptive frame and field indicator. A motion refinement module generates refined motion vectors for the macroblock pair, based on the subset of available partitions for a macroblock pair.

In one implementation, a substance removal apparatus may include a collection unit and a removal unit. The collection unit may have a structure forming a channel and an inlet to receive an exhaust from a print system. The removal unit may separate a substance from the exhaust and transfer heat from the exhaust to the print system. The removal unit may include a heat exchanger and an impaction mechanism.

The invention relates to a device for the hydrolysis of preferably solid organic substrates, in particular of energy crops and plant residues, with a collection vessel (1) for receiving the organic substrates, with a conveying means (4) for transporting the organic substrates into a charging device (7) for the batch-wise charging of a hydrolyzer (10) with the organic substrates, the hydrolyzer (10) being provided on the output with a pressure-release device (12) having a valve-controlled pressure diaphragm (13) and a steam trap (14) arranged upstream of an expander tank (15). According to the invention, the conveying means (4) includes a conveyor worm (4') with a sleeve shaft (25), which is charged with hot steam from the steam trap (14), which is preferably designed as a cyclone, the sleeve shaft (25), in the conveying zone for the organic substrate, having, in a heating zone (18), steam-outlet openings (26) for directly charging the organic substrate with hot steam.

The present disclosure provides for a fibrous structure having an initial total wet tensile strength of greater than about 118 g/cm and at least one embossed ply having a surface thereof. The surface has a surface area comprising from about 10.0 percent to about 20.0 percent line embossments. Also, a fibrous structure having at least two plies is disclosed. One of the two plies has an initial total wet tensile strength of greater than about 118 g/cm and at least one embossed ply having a surface thereof. The surface has a surface area comprising from about 10.0 percent to about 20.0 percent line embossments.

A semiconductor substrate for use in an integrated circuit, the semiconductor substrate including a channel defined on a surface of the substrate. The channel includes a first wall, a second wall, and a third wall. The first wall is recessed from the surface. The second wall extends from the surface to the first wall. The third wall extends from the surface to the first wall and faces the second wall across the channel. At least one of the second wall and the third wall includes a plurality of structures projecting into the channel from the second wall or the third wall.

The present invention aims at improving a recovery rate of a positive-pole active substance and preventing a recovery loss of valuable metals when a positive-pole active substance is separated from a lithium ion battery. In the present invention, a material resulting from battery dismantling obtained by dismantling a lithium ion battery is stirred using a surfactant solution, whereby a positive-pole active substance is separated from a positive-electrode substrate. Also, it is preferable that an alkaline solution is added to a positive-electrode material of a material resulting from battery dismantling, thereby dissolving a positive-electrode substrate to which a positive-pole active substance adheres to obtain a slurry containing the positive-pole active substance, and a surfactant solution is added to the slurry to disperse the positive-pole active substance in the slurry, whereby the positive-pole active substance is separated from the alkaline solution.

A metal laminated substrate for an oxide superconducting wire is manufactured such that a non-magnetic metal plate T1 having a thickness of not more than 0.2 mm and a metal foil T2 made of Cu alloy which is formed by cold rolling at a draft of not less than 90% and has a thickness of not more than 50 μm is laminated to each other by room-temperature surface active bonding, after lamination, crystal of the metal foil is oriented by heat treatment at a temperature of not less than 150° C. and not more than 1000° C. and, thereafter, an epitaxial growth film T3 made of Ni or an Ni alloy having a thickness of not more than 10 μm is laminated to the metal foil.

The present invention relates to methods and compositions for coating aluminum substrates. In an embodiment, the invention includes a method of applying a coating on an aluminum substrate including contacting the aluminum substrate with a first solution. The first solution can include a zinc metal salt, a sugar acid or alkali metal salt thereof, and an alkali metal hydroxide. The method can also include contacting the aluminum substrate with a second solution. The second solution can include a molybdate salt, an alkanolamine, and a fluorine acid. Other embodiments are also included herein.

A substrate processing apparatus that includes a process tank having a pair of opposed sidewalls for storing a chemical liquid, and processing a plurality of substrates by the chemical liquid; a substrate holding mechanism including a holding part for holding the plurality of substrates, and a back part connected to the holding part and interposed between the substrates held by the holding part and one sidewall of the pair of opposed sidewalls when the substrate holding mechanism is loaded into the process tank. A heating device is disposed on the process tank for heating the stored chemical liquid. The heating device includes at least a first heater disposed on the one sidewall, and a second heater disposed on the other sidewall of the pair of opposed sidewalls. Energy outputs of the first heater and the second heater are independently controlled.

Substrate treatment systems are provided. The substrate treatment systems may include a treating device configured to treat a substrate with a supercritical fluid, and a supplying device configured to supply the supercritical fluid to the treating device. The treating device may include a supercritical process zone in which the substrate is treated with the supercritical fluid, and a pre-supercritical process zone in which the supercritical fluid is expanded and then provided into the supercritical process zone to create a supercritical state in the supercritical process zone.

A nozzle of a nozzle device includes an arm pipe that extends in a horizontal direction and a downstream pipe formed so as to curve downward from one end of the arm pipe. In the nozzle, a metallic pipe is provided inside a second resin pipe. Moreover, a first resin pipe is provided inside the metallic pipe. A boss is attached to the tip of the metallic pipe between the first resin pipe and the second resin pipe. At the tip of the nozzle, an outer peripheral surface of the first resin pipe, an end surface of the second resin pipe and an end surface of the boss are welded by welding resin. In this way, the metallic pipe is reliably coated with the first resin pipe, the second resin pipe, the boss and the welding resin.

Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants from a substrate surface is provided which includes exposing a substrate to a peroxide clean solution, exposing the substrate to a hydroxide clean solution, and exposing the substrate to a selective etch solution containing potassium iodide, iodine, sulfuric acid, and water during a selective etch process. The substrate generally contains gallium arsenide material, such as crystalline gallium arsenide, and is usually a growth substrate for an epitaxial lift off (ELO) process. The copper or other metallic contaminants disposed on the substrate may be selectively etched at a rate of about 500 times, about 1,000 times, about 2,000 times, or about 4,000 times or greater than the gallium arsenide material.

A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate.

A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

A preservation system for storage and logistic transport of nutritional substances. The preservation system obtains information about the nutritional substance to be preserved, senses and measures the external environment to the preservation system, senses and measures the internal environment to the preservation system, senses and measures the state of the nutritional substance, and stores such information throughout the period of preservation. Using this accumulated information, the preservation system can measure, or estimate, changes in nutritional content (usually degradation) during the period of preservation. Additionally, the preservation system can use this information to dynamically modify the preservation system to minimize detrimental changes to the nutritional content of the nutritional substance, and in some cases actually improve the nutritional substance attributes.

A temporary adhesive for reversibly bonding a silicon wafer to a silicon support contains a crosslinkable organopolysiloxanes composition and a fatty acid or salt thereof or fatty acid ester as a release regulator having a density different from the crosslinkable organopolysiloxanes composition of at least 0.1 g/cm3, which upon parting of the wafer from the substrate, the adhesive remains substantially adhered to the substrate.

The present invention provides a method for bonding two substrates using a UV radiation curing-redox curing adhesive system having a shadow area and a transparent area, comprising: bonding the shadow area of the substrates using a redox curing adhesive system, and bonding the transparent area of the substrates using a liquid optically clear adhesive containing UV initiators.

Disclosed is a liquid processing apparatus capable of accurately determining a holding state of a substrate without being influenced by, for example, material or surface condition of a substrate. The liquid processing apparatus includes a substrate holding unit that holds a substrate, a camera that photographs a region where a peripheral edge portion of substrate is present when substrate is properly held by the substrate holding unit, and a control unit that determines a holding state of the substrate held by the substrate holding unit based on an image photographed by the camera.

An improved composition comprising substantial spherical UFP particles and an active agent, such as NBPT, and optionally other components is used as an additive for liquid and solid fertilizers, typically containing urea. Methods of making the compositions and their use are also disclosed.

Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator.

Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing the pattern collapse or the occurrence of contamination. A substrate is held in a liquid bath while being immersed in a liquid, and the liquid bath is disposed in a processing space of a processing vessel. A processing of drying the substrate is performed by replacing the liquid in the liquid bath with a supercritical-state fluid. A predetermined mechanism moves liquid bath between a processing location in the processing case and a stand-by location outside the processing case. A heater installed in the processing case changes the fluid to a supercritical state or maintains the supercritical state while cooling mechanisms cool down the liquid bath moved to the stand-by location outside the processing vessel.

A substrate treatment system for treating substrates in a continuous process includes a system chamber delimited by chamber walls, having an entry lock and an exit lock, and also at least one substrate treatment device and a transportation device inside the system chamber. The transportation device has an arrangement of transportation rollers arranged one behind the other in the transportation direction, for vertical or horizontal transportation of substrates. The rotor of the drive device is arranged under the pressure conditions prevailing in the system chamber and the stator of the drive device is arranged outside the pressure conditions prevailing in the system chamber.

The present invention discloses a roller for conveying glass substrate. The roller includes a structure of roller body that is formed by assembling a plurality of roller components together in a disassembleable manner. An axle bore is formed in center of the roller. The present invention also discloses a roller axle assembly for conveying glass substrate, which includes a plurality of rollers and a roller axle. A distance is formed between adjacent ones of the rollers. Each of the plurality of rollers is individually disassembleable. The roller for conveying glass substrate and the roller axle assembly according to the present invention allows any one of the rollers that are mounted to a roller axle assembly to be disassembled individually thereby shortening the time period for replacing the glass substrate roller, increasing the utilization rate of the roller, and lowering down the device maintenance cost.

The spinning station of a spinning machine includes a yarn end disposal means, arranged between the outlet of the spinning device and the winding device, and with the aid of which an end section of the produced yarn is separated from the rest of the yarn and eliminated. Furthermore, a process for removing an end section of a yarn at a spinning station of a spinning machine prior to the subsequent piecing process is proposed, wherein the end section is gripped, cut off, and subsequently eliminated from the area of the spinning station with the aid of a yarn end disposal means arranged between the outlet of the spinning device and the winding device.

Devices, cartridges, and method are described herein for emulating smoking wherein a device generates an aerosol for inhalation by a subject by heating a viscous material that can have a tactile response in the mouth or respiratory tract, while reducing Hoffman analytes and mutagenic compounds delivered to the user as compared to a common tobacco cigarette.

Method of applying phase transition substance to impart reduced ignition propensity to a smoking article comprising a tobacco column and a wrapper surrounding the tobacco column and having a porous structure with a base permeability. The method comprising forming a pattern of phase transition material on the wrapper such that, when subjected to the heat of the tobacco column burning firecone, the phase transition material at least partially fills the wrapper porous structure in the vicinity of the burning firecone to form an area on the wrapper having reduced permeability lower than that of the wrapper base permeability. The reduced permeability of the wrapper in the vicinity of the burning firecone imparts reduced ignition propensity such that there is insufficient air flow to sustain combustion of the firecone or insufficient air flow to sustain an intensity of the burning firecone necessary to ignite the substrate.

A touch drive circuit and a driving method therefor, an array substrate and a touch display apparatus relate to a field of display. The driving method includes: during touch scanning time period in one frame, by each of output control unit (2), receiving a touch enable signal, a common voltage signal and a touch scanning signal, and receiving an output signal of an shift register unit connected with the output control unit; and outputting, by each of the output control units, the touch scanning signal to a touch drive electrode connected with the touch control unit in a first time period according to the touch enable signal and the output signal of the shift register unit connected with the output control unit, wherein the first time period is scanning time allocated to the touch drive electrode in one frame of time.

A method of analyzing a positional relationship between a dental restoration and a dental substructure. The method has steps of scanning a reference area and determining the shape of the dental substructure in its positional relationship to the reference area, and thereby providing a virtual dental substructure model and scanning the reference area along with scanning at least a portion of the dental restoration in fit position with the dental substructure to provide a virtual assembly model. The method further has the step of providing fitting quality information between the dental restoration model and the dental substructure model. The method utilizes superposing of further virtual models to provide the fitting quality information. The method facilitates the assessment of the quality of the fit between a dental restoration and a dental substructure.

The present invention relates to a cosmetic composition for dyeing keratin fibers, in particular human keratin fibers such as the hair, comprising: a) one or more fatty substances; b) one or more surfactants; c) one or more oxidation bases; d) one or more couplers based on 2-hydroxynaphthalene derivatives or particular phenol derivatives, acylaminophenol derivatives or quinoline derivatives; f) one or more basifying agents; e) optionally one or more chemical oxidizing agents; and the fatty substance content representing in total at least 25% by weight relative to the total weight of the formulation. The present invention also relates to a process using this composition, and to a multi-compartment device that is suitable for performing the said process.

One embodiment includes a method comprising the steps of providing a first dry catalyst coated gas diffusion media layer, depositing a wet first proton exchange membrane layer over the first catalyst coated gas diffusion media layer to form a first proton exchange membrane layer; providing a second dry catalyst coated gas diffusion media layer; contacting the second dry catalyst coated gas diffusion media layer with the first proton exchange membrane layer; and hot pressing together the first and second dry catalyst coated gas diffusion media layers with the wet proton exchange membrane layer therebetween.

The invention relates to a device for evaporating volatile substances, comprising a heat source (5) evaporating volatile substances from a refill (2), a heat detector (4) which can detect the heat from said heat source (5), and indicating means (7) connected to said heat detector (4) emitting an indication when the heat detector (4) detects the heat from said heat source (5), and characterized in that said heat detector (4) is placed above said heat source (5). The invention allows the indicating means to be activated virtually in a simultaneous manner with the placement of the heat emitter.

Water-free compositions suitable for application as a surface size to a cellulosic substrate, and methods of applying the water-free compositions to the surface of a cellulosic substrate.

In one embodiment, a substrate processing apparatus includes a substrate retainer and a substrate rotator to retain and rotate a substrate, liquid feeders to supply a cleaning liquid, a rinse liquid and a first coating liquid to a first face of the substrate, a heater to heat the substrate from a second face of the substrate, and a controller to control processing of the substrate. The controller supplies the first coating liquid to the first face while rotating the substrate at a first number of revolution. The controller heats the substrate from the second face while rotating the substrate at a second number of revolution that is different from the first number of revolution after the first coating liquid is supplied, to evaporate a solvent from the first coating liquid to form a coating film containing a solute of the first coating liquid on the first face.

A low surface tension liquid is supplied from a low surface tension liquid supplying unit to a heated substrate to replace a processing liquid by the low surface tension liquid. The heating of the substrate is weakened and the low surface tension liquid is supplied from the low surface tension liquid supplying unit to the substrate, so that a liquid film of the low surface tension liquid is formed. The liquid film on the substrate is removed by strengthening the heating of the substrate without supplying the low surface tension liquid from the low surface tension liquid supplying unit to a central region of the substrate.

Systems and methods for the formation of nanostructures, including carbon-based nanostructures, are generally described. In certain embodiments, substrate configurations and associated methods are described.

There is provided a substrate processing apparatus including a first exhaust system which is connected to a first pump and a second pump of a type different from the first pump and is configured to exhaust the interior of a process chamber, a second exhaust system which is connected to the second pump and is configured to exhaust the interior of the process chamber and a control part configured to control the first exhaust system and the second exhaust system such that, when the processing gas is exhausted from the interior of the process chamber, the interior of the process chamber is first exhausted by the second exhaust system, and then an exhaust path is switched from the second exhaust system to the first exhaust system after an internal pressure of the process chamber reaches a predetermined pressure, to exhaust the process chamber by the first exhaust system.

Systems and methods for dehydrating a natural gas stream are provided herein. The system includes a lean solvent feed system, including a line from a topsides facility, wherein the line is configured to divide a lean solvent stream to feed lean solvent to each of a number of co-current contacting systems in parallel. The co-current contacting systems are placed in series along a wet natural gas stream, wherein each of the co-current contacting systems is configured to contact the lean solvent stream with the wet natural gas stream to adsorb at least a portion of the water from the wet natural gas stream to form a dry natural gas stream. A rich solvent return system includes a line to combine rich solvent from each of the plurality of co-current contacting systems and return a rich solvent stream to the topsides facility.

A manufacturing method of a package substrate is provided. The method includes forming a first circuit layer on a carrier. A passive component is disposed on the first circuit layer and the carrier. A dielectric layer is formed on the carrier to embed the passive component and the first circuit layer in the dielectric layer. A second circuit layer is formed on the dielectric layer. The carrier is removed from the dielectric layer. A manufacturing method of a chip package is also provided.

A system for determining thickness variation values of a semiconductor substrate comprises a substrate vacuumed to a pedestal that defines a reference plane for measuring the substrate. A measurement probe assembly determines substrate CTV and BTV values, and defines a substrate slope angle. A thermal bonding assembly attaches a die to the substrate at a bonding angle congruent with the substrate slope angle. A plurality of substrates are measured using the same reference plane on the pedestal. Associated methods and processes are disclosed.

Package structures and methods are provided to integrate optoelectronic and CMOS devices using SOI semiconductor substrates for photonics applications. For example, a package structure includes an integrated circuit (IC) chip, and an optoelectronics device and interposer mounted to the IC chip. The IC chip includes a SOI substrate having a buried oxide layer, an active silicon layer disposed adjacent to the buried oxide layer, and a BEOL structure formed over the active silicon layer. An optical waveguide structure is patterned from the active silicon layer of the IC chip. The optoelectronics device is mounted on the buried oxide layer in alignment with a portion of the optical waveguide structure to enable direct or adiabatic coupling between the optoelectronics device and the optical waveguide structure. The interposer is bonded to the BEOL structure, and includes at least one substrate having conductive vias and wiring to provide electrical connections to the BEOL structure.

A method of manufacturing a thin film transistor is disclosed. The method of manufacturing the thin film transistor includes: manufacturing a substrate; forming an oxide semiconductor layer on the substrate; forming a pattern including an active layer through a patterning process; forming a source and drain metal layer on the active layer; and forming a pattern including a source electrode and a drain electrode through a patterning process, an opening being formed between the source electrode and the drain electrode at a position corresponding to a region of the active layer used as a channel, wherein the step of forming the pattern including the source electrode and the drain electrode through a patterning process includes: removing a portion of the source and drain metal layer corresponding to the position of the opening through dry etching. The method may also be used to manufacturing a thin film transistor.

A TFT and manufacturing method thereof, an array substrate and manufacturing method thereof, an X-ray detector and a display device are disclosed. The manufacturing method includes: forming a gate-insulating-layer thin film (3'), a semiconductor-layer thin film (4') and a passivation-shielding-layer thin film (5') successively; forming a pattern (5') that includes a passivation shielding layer through one patterning process, so that a portion, sheltered by the passivation shielding layer, of the semiconductor-layer thin film forms a pattern of an active layer (4a'); and performing an ion doping process to a portion, not sheltered by the passivation shielding layer, of the semiconductor-layer thin film to form a pattern comprising a source electrode (4c') and a drain electrode (4b'). The source electrode (4c') and the drain electrode (4b') are disposed on two sides of the active layer (4a') respectively and in a same layer as the active layer (4a'). The manufacturing method can reduce the number of patterning processes and improve the performance of the thin film transistor in the array substrate.

An array substrate of organic light-emitting diodes and a method for fabricating the same are provided to narrow an edge frame of product device of organic light-emitting diodes, to shorten the package process time, and to improve the substrate utilization and the production efficiency. The array substrate of organic light-emitting diodes includes a plurality of display panels disposed in an array of rows and columns, wherein at least two adjacent display panels are connected through a frame adhesive, and there is no cutting headroom between at least one side of the at least two adjacent display panels.

A method for forming a vehicular brake rotor involving loading a shaped metal substrate with a mixture of metal alloying components and ceramic particles in a dieheating the contents of the die while applying pressure to melt at least one of the metal components of the alloying mixture whereby to densify the contents of the die and form a ceramic particle-containing metal matrix composite coating on the metallic substrate; and cooling the resulting coated product.