Aqueous glyphosate formulations comprising a surfactant derived from metathesized natural oil feedstocks are disclosed. The formulations comprise a glyphosate salt, water, and a surfactant derived from a metathesis-derived C10-C17 monounsaturated acid, octadecene-1,18-dioic acid, or their ester derivatives. The surfactant is selected from C10 or C12 amine oxides, C10 or C12 quats, C10, C12, or C16 amidoamines, C10 or C12 amidoamine oxides, C10 imidazoline quats, C10 or C12 amidoamine quats, C10, C12, or C16 betaines, C16 amidoamine betaines, C18 diamidoamines, C18 diamidoamine oxides, C18 diamidoamine diquats, C18 diamidoamine oxide quats, C18 diamidoamine oxide betaines, Cis diamidoamine monobetaines, C18 diamidoamine monobetaine quats, C18 ester amidoamine quats, and amidoamines and their oxidized or quaternized derivatives made from self- or cross-metathesized palm or soybean oil. The surfactants noted above impart substantial stability to highly concentrated glyphosate formulations at, above, and below room temperature and perform as well or better than commercial alternatives.

The present invention is directed towards microcapsules, uses and methods of microencapsulation with improved properties regarding agglomeration, bleeding and control of the reaction. The invention is especially suitable for chemical compounds with at least one carboxamide group, preferably for microencapsulation of those compounds wherein the carbonyl group is attached to a nitrogen atom or nitrogenated heterocycle and wherein the microencapsulation reaction may be too vigorous. The microcapsules are characterized by a mixed glycoluril-polyurea polymer wall, wherein the polyurea groups come from a urea-formaldehyde resin and not from isocyanate monomers or prepolymers. The process of making such microcapsules a dispersant in the oil phase of the type of block copolymer of vinylpyrrolidone/vinylalkene and/or vinylpyrrolidone/vinyl acetate and the microencapsulation reaction may be carried out without the presence of any polyamine/polyol acting as a catalyst.

The present invention generally relates to a method for minimizing the formation of insoluble salts of phenoxy herbicides. The method comprises (1) mixing a compatibility agent, amine salts of phenoxy acid herbicides, and a chemical containing non-amine cations in a aqueous system to form a stable and non-nozzle plugging solution; and (2) application of said stable and non-nozzle plugging solution onto target plants.

The present disclosure relates to a method to determine a volume of clearance surrounding a wellbore. A logging tool is provided. The logging tool may be disposed on a wireline, a drill string, or a wired drill pipe. A formation property is obtained using the logging tool. The formation property may include a voltage, a bulk resistivity, a horizontal resistivity, a vertical resistivity, a porosity, a permeability, a fluid saturation, an NMR relaxation time, a borehole size, a borehole shape, a borehole fluid composition, an MWD parameter, or an LWD parameter. The maximum depth of investigation into the subsurface formation is determined using a model response and a noise level, and the volume of clearance is determined using the determined maximum depth of investigation. The maximum depth of investigation and volume of clearance may be determined even though no boundary layers are detected.

A subject information acquisition apparatus includes a first holding member that holds a subject, a probe that receives an elastic wave from the subject through the first holding member, a first holding member deformation amount measuring unit that measures an amount of deformation of the first holding member, and a processing unit that creates an area for generating subject information by using the amount of deformation of the first holding member and position information of the first holding member deformation amount measuring unit and generates an information value of subject information corresponding to the area for generating subject information by using a signal outputted by the probe.

A sensor information acquisition section acquires angular velocity information (GX, GY, GZ) around three axes acquired by three angular velocity sensors, and acceleration information (AX, AY, AZ) in three axial directions acquired by three acceleration sensors. A posture information calculation section calculates a posture angle and position coordinates in a virtual three-dimensional space based on the angular velocity information (GX, GY, GZ) and the acceleration information (AX, AY, AZ). The posture information calculation section calculates a fixed coordinate system velocity vector based on an inertial coordinate system acceleration vector (A) obtained from the acceleration information (AX, AY, AZ), and calculates position coordinates in a virtual three-dimensional space corresponding to the fixed coordinate system velocity vector.

A method of performance monitoring in a data processing environment is provided. The data processing environment includes multiple systems, each of which has resources. Each resource relates to a resource type, wherein at least one performance parameter is defined for each resource type. The method includes determining a value of the at least one performance parameter for at least one resource, aggregating performance parameter values and related resources of a resource type, creating for at least a part of the resources a next predefined aggregation level which includes all resources relating to the resource type and associating all performance parameter values to this aggregation level, and repeating the creating for at least a part of the resources a next predefined aggregation level until a predefined target aggregation level of the data processing environment has been reached.

A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition.

A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive.

There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1):wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, andwherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic cation or a metal cation,

This invention is directed to a polymer thick film UV-curable thermoformable dielectric composition. Dielectrics made from the composition can be used in various electronic applications to protect electrical elements and particularly to insulate and protect both the conductive thermoformable silver and the polycarbonate substrate below it in capacitive switch applications. The thermoformed capacitive switch circuit may be subsequently subjected to an injection molding process.

Solid-state deformation processing of crosslinked high molecular weight polymers such as UHMWPE, for example by extrusion below the melt transition, produces materials with a combination of high tensile strength and high oxidative stability. The materials are especially suitable for use as bearing components in artificial hip and other implants. Treated bulk materials are anisotropic, with enhanced strength oriented along the axial direction. The material is oxidatively stable even after four weeks of accelerated aging in a pressure vessel containing five atmospheres of oxygen (ASTM F2003). Because of its oxidative stability, the deformation processed material is a suitable candidate for air-permeable packaging and gas sterilization, which has thus far been reserved for remelted crosslinked UHMWPE.

The present invention provides an acrylic resin composition containing a polycrystal of colloidal particles of silicon oxide in an acrylic resin that is formed by curing an acrylic monomer liquid at room temperature and/or an acrylic oligomer liquid at room temperature, wherein a mean distance between the colloidal particles in the polycrystal is 140 to 330 nm. The size of the single crystal that constitutes the polycrystal can be controlled by adjusting the content of silicon oxide and/or the additive amount of impurities. An architectural material, a fashion accessory, and an optical material are provided that are formed by using the acrylic resin composition.

A thermal image receiver element dry image receiving layer has a Tg of at least 25° C. as the outermost layer. The dry image receiving layer has a dry thickness of at least 0.5 μm and up to and including 5 μm. It comprises a polymer binder matrix that consists essentially of: (1) a water-dispersible acrylic polymer comprising chemically reacted or chemically non-reacted hydroxyl, phospho, phosphonate, sulfo, sulfonate, carboxy, or carboxylate groups, and (2) a water-dispersible polyester that has a Tg of 30° C. or less. The water-dispersible acrylic polymer is present in an amount of at least 55 weight % of the total dry image receiving layer weight and at a dry ratio to the water-dispersible polyester of at least 1:1 to and including 20:1. The thermal image receiver element can be used to prepare thermal dye images after thermal transfer from a thermal donor element.

Hybrid topcoat formulations comprising a water soluble polymer and a water dispersible polymer provide improved adhesion to underlying surfaces. Paper products coated with these formulations, such as thermal paper, achieve high stain resistance and improved adhesion of UV cured silicone release layers.

The present invention relates to a web substrate comprising an activatable colorant and at least one deformed region. A first activated color region is produced in the web substrate upon exposure to a first external stimulus and a second activated color region is produced within the first activated color region upon exposure to a second external stimulus. The second activated color region coincides with the deformed region.

The invention provides for a method of forming methanol by combining a mixture of methane, water and carbon dioxide under reaction conditions sufficient to form a mixture of hydrogen and carbon monoxide. Hydrogen and carbon monoxide are reacted under conditions sufficient to form methanol. The molar ratio of hydrogen to carbon monoxide is at least two moles of hydrogen to one mole of carbon monoxide and the overall molar ratio between methane, water and carbon dioxide is about 3:2:1. Methane, carbon dioxide and water are bi-reformed over a catalyst. The catalyst includes a single metal, a metal oxide, a mixed catalyst of a metal and a metal oxide or a mixed catalyst of at least two metal oxides.

A device for the collection and processing of information relating to the exposure of one or more persons to one or more products of chemical or biological origin has: at least one coded sensor for automatic or semi-automatic identification of a person likely to be exposed to at least one product,at least one coded sensor for the collection of information relating to the handling of at least one product by the person likely to be exposed to the product,at least one sensor for validating the information collected by the identification and collection sensors,at least one module for reading at least one coded sensor, anda module for processing information collected by the sensors.

A method of providing data included in a building information modeling (BIM) data file using a server is provided. The method includes retrieving mapping data corresponding to a user request, extracting data corresponding to at least one entity mapped to the mapping data from the BIM data file, and transmitting the extracted data to a client.

A coating composition comprising: an aqueous dispersion comprising: the melt-kneading product of (A) a base polymer which comprises one or more thermoplastic polymers, (B) a stabilizing agent which comprises at least one component selected from the group consisting of acrylic acid grafted ethylene-based polymers and maleic anhydride grafted polyolefins; (C) a neutralizing agent; and (D) water; wherein the aqueous dispersion has a volume average particle size of less than about 5 μm is provided.

A method is described for improving the uniformity over a predetermined substrate area of a spectral response of photonic devices fabricated in a thin device layer. The method includes (i) establishing an initial device layer thickness map for the predetermined area, (ii) establishing a linewidth map for the predetermined area, and (iii) establishing an etch depth map for the predetermined area. The method further includes, based on the initial device layer thickness map, the linewidth map and the etch depth map, calculating an optimal device layer thickness map and a corresponding thickness correction map for the predetermined substrate area taking into account photonic device design data. Still further, the method includes performing a location specific corrective etch process in accordance with the thickness correction map.

According to the embodiments, a pattern formation method includes a process of formation of a self-assembly material layer containing at least a first segment and a second segment on a substrate having a guide layer, a process of formation of a neutralization coating on the self-assembly material layer, and a process of formation of a self-assembly pattern including a first region containing the first segment and a second region containing the second segment following phase separation of the self-assembly material layer.

The invention relates to the application of a coating to a substrate in which the coating includes a polymer material and the coating is selectively fluorinated and/or cured to improve the liquid repellance of the same. The invention also provides for the selective fluorination and/or curing of selected areas of the coating thus, when completed, providing a coating which has regions of improved liquid repellance with respect to the remaining regions and which remaining regions may be utilized as liquid collection areas.

Provided are methods of depositing polymer solutions on substrates to form various optical elements. A polymer solution may include about 0.1%-30% by weight of a specific polymer having rigid rod-like molecules. The molecules may include various cores, spacers, and sides groups to ensure their solubility, viscosity, and cross-linking ability. The deposition techniques may include slot die, spray, molding, roll coating, and so forth. Pre-deposition techniques may be used to improve wettability and adhesion of substrates. Post-deposition techniques may include ultraviolet cross-linking, specific drying techniques, evaporation of solvent, treating with salt solutions, and shaping. The disclosed polymers and deposition processes may yield optical elements with high refractive index values, such as greater than 1.6. These optical elements may be used as +A plates, −C plates, or biaxial polymers and used as retarders in LCD active panels or as light collimators and light guides.

A disposable electrode includes: an electrode pad; and a connector, connecting the electrode pad to a defibrillator, and including an information holder that can be provided with a transmissive opening or a light reflective member, the information holder holding information about at least an expiration date, depending on presence or absence of the transmissive opening or the light reflective member, the information holder allowing the information to be notified from the defibrillator when the connector is connected to the defibrillator.

An apparatus for forming pressed food products can utilize up to 98% chicken breast meat in high profit margin products. Breast meat is marinated and then extruded into a slab which is then frozen and shaped into a plank. The plank is sliced into unit portions which are then pressed into shaped portions with a preferred, or other, press. One preferred press linearly reciprocates unit portions into the press. This or another preferred press imparts three dimension exterior shape to the pressed food products.

The present utility model provides a mold set used for dumpling or dumpling-like food product formation comprising a pair of jaws, the closure of which is configured to clamp a dough pad over a filling thereby forming a raw product of the dumpling or dumpling-like food product, wherein the jaws in a closed condition can be driven to simulate the human action of compressing a filling pocket of the dumpling or dumpling-like food product.

A method of forming a component (30) by isostatic pressing, the method comprising: providing a canister (4) suitable for isostatic pressing, the canister comprising first and second membranes (14, 16) which, in use, are disposed within the canister (4); the first and second membranes (14, 16) defining a component cavity (24) disposed between the first and second membranes (14, 16), a first tool cavity (26) disposed between the first membrane (14) and an adjacent wall (10) of the canister (4), and a second tool cavity (28) disposed between the second membrane (16) and another adjacent wall (12) of the canister (4); filling the component cavity (24) with the component powder for forming the component (30); filling the first and second tool cavities (26, 28) with a second tool powder; and isostatically pressing the canister (4) to form the component (30).

A core-pin assembly composed of a primary core-pin and at least one secondary core-pin. The primary core-pin has a primary core-pin body defining at least one element for coupling with a mating end of at least one secondary core-pin. The secondary core-pin has a mating end and a secondary core-pin body. The mating end is configured to fit with the element defined in the primary core-pin body such that the primary core-pin and the secondary core-pin(s) reversibly join together to form a branching structure. The assembly may further include at least one tertiary core-pin and the secondary core-pin body may define at least one element for coupling with a mating end of at least one tertiary core-pin. The mating end of the tertiary core pin is configured to fit with the secondary core-pin body such that the primary core-pin, secondary and tertiary core-pin(s) reversibly join together forming a branching structure.

Provided is a rigid core for forming a tire, configured so that the intrusion of rubber into a gap between core segments is prevented and so that the lowering of roundness of a core body s prevented. The core body comprises a plurality of circumferentially divided core segments. Both circumferential end surfaces of each of the core segments are used as mating surfaces, and the mating surfaces adjacent to each other in the circumferential direction are abutted against each other to form the core body. At least one of the mating surfaces adjacent to each other in the circumferential direction is formed as a stepped mating surface comprising a bordering surface region extending along an outer circumferential edge of the mating surface, and a recessed surface region surrounded by the bordering surface region and recessed in a step shape from the bordering surface region so that only the bordering surface region contacts with the adjacent mating surface.

A rigid core for forming a tire is configured so that the non-uniformity of the amount of thermal expansion of the core body is reduced to improve the quality of the tire. The core body comprises divided core pieces (10i , 10o) divided inward and outward in a tire radial direction at a tire radial position (P) including a maximum width position (P0) of the tire forming surface. Outward divided core pieces (10o) disposed outward in the tire radial direction than the maximum width position (P0) and inward divided core pieces (10i) disposed inward in the tire radial direction than the maximum width position (P0) are respectively formed of metal materials different from each other in coefficient of thermal expansion. The coefficient of thermal expansion of the inward divided core piece (10i) is higher than a coefficient of thermal expansion of the outward divided core piece (10o).

An apparatus and method for the shaping of plastics material pre-forms into plastics material containers with at least one blow moulding station which is arranged on a conveying device rotatable about a pre-set axis of rotation (D). The blow moulding station has a blow mould and this blow mould forms a cavity in the interior of which the plastics material pre-forms are capable of being expanded by being acted upon with a gaseous medium to form the plastics material containers, with a stressing device, which acts upon the plastics material pre-forms with the gaseous medium in order to expand them, and with a clean room, which surrounds the blow moulding station at least in part. The clean room is bounded off from an environment by at least two walls which are movable relative to one another.

A method of transferring a foil comprising: forming a foil transferring face on a photoreceptor employing a foil transferring face forming toner; transferring the foil transferring face onto a base substance, followed by fixing the foil transferring face; supplying a transfer foil having at least a foil and an adhesive layer on the base substance having the fixed foil transferring face, heating the transfer foil and the foil transferring face while the adhesive layer of the transfer foil is in contact with the foil transferring face to adhere the foil onto the foil transferring face; removing the transfer foil from the base substance while leaving the foil adhered onto the foil transferring face, wherein the foil transferring face forming toner comprises at least a binder resin, wherein the binder resin comprises a polymer formed by using a vinyl monomer comprising at least a carboxyl group.

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.

A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.

A resin composition for forming an optical waveguide brings together excellent bending resistance, a low refractive index, and low tackiness suitable for a roll-to-roll (R-to-R) process as a material for forming an optical waveguide, in particular, a material for forming a clad layer. The resin composition for forming an optical waveguide to be used in formation of an optical waveguide includes a polyvinyl acetal compound having a structural unit represented by the following general formula (1) as a main component: in the formula (1), R represents an alkyl group having 1 to 3 carbon atoms, and k, m, and n represent ratios of respective repeating units in a main chain and each represent an integer of 1 or more.

Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material may be formed by spin-casting a conformal layer of the first material across the features, or by selective deposition along the features relative to the substrate. After the first material is formed, fill material may be provided between the features while leaving regions of the first material exposed. The exposed regions of the first material may then be selectively removed relative to both the fill material and the features to create the pattern of openings.

In a first thermal transfer portion of upstream side, a negative toner image forming portion forms on a photosensitive drum a desired negative toner image which reverses a desired positive toner image selected from all the toner images. The negative toner image forming portion then forms the desired negative toner image on a belt member. The first thermal transfer portion transfers a desired negative foil image from a foil sheet to the belt member so that a desired positive foil image remains on the foil sheet. A second transfer portion transfers the desired positive foil image thus remained on the desired positive toner image formed on the sheet of paper. A cleaning portion removes the desired negative toner image and the desired negative foil image from the belt member.

To provide an amine compound, represented by General Formula (I) below: [In General Formula (I), R1 and R2 represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aromatic hydrocarbon group, which may be identical or different; m and n are an integer of 1 or 0; Ar1 represents a substituted or unsubstituted aromatic hydrocarbon group; Ar2 and Ar3 represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aromatic hydrocarbon group; and Ar1 and Ar2 or Ar2 and Ar3 may bind to each other to form a substituted or unsubstituted heterocyclic group including a nitrogen atom.]

The present invention provides a carrier for a two-component electrophotographic developer, comprising a core particle and a thermoset silicone resin layer coated thereon, wherein said layer comprises a charge control agent and is formed by heat-treatment at a temperature below the melting point of said charge control agent.

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

A method of tailoring the shape of a plurality of relief printing dots created in a photosensitive printing blank during a platemaking process including the steps of: (a) selectively exposing at least one photocurable layer to a source of actinic radiation to selectively crosslink and cure the at least one photocurable layer; and (b) developing the exposed at least one photocurable layer to reveal the relief image therein, said relief image comprising the plurality of relief printing dots. The source of actinic radiation comprises a source of UV light in the UV-A range and a source of light in the UV-C range. The at least one photocurable layer is simultaneously exposed to the source of UV light in the UV-A range and the source of UV light in the UV-C range to produce printing dots having at least one desired geometric characteristic.

A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes, a plurality of first assist features for restricting pattern distortion of the first dummy contact holes disposed inside a corresponding one of the first dummy contact holes, and an array of second assist features for additionally restricting pattern distortion of the first dummy contact holes. The array of second assist features is disposed outside of the first dummy contact holes. The method also includes forming an array of contact holes and first dummy contact holes on a wafer by using the photomask as an exposure mask.

Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.