The disclosed embodiments relate to pulse oximetry. An exemplary pulse oximeter comprises a probe that is adapted to be attached to a body part of a patient to create a signal indicative of an oxygen saturation of blood of the patient, and a processor that is adapted to receive the signal produced by the probe, to calculate an SPO2 value based on the signal, to detect a plurality of pattern types of SPO2 indicative of pathophysiologic events, and to produce an output indicative of a detected one of the plurality of pattern types.

A chemically amplified resist composition comprising a base polymer and an amine quencher in the form of a β-alanine, γ-aminobutyric acid, 5-aminovaleric acid, 6-aminocaproic acid, 7-aminoheptanoic acid. 8-aminooctanoic acid or 9-aminononanoic acid derivative having an unsubstituted carboxyl group has a high contrast of alkaline dissolution in rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide DOF.

A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units having a tertiary ester type acid labile group having a plurality of methyl or ethyl groups on alicycle and an acid generator onto a substrate, prebaking, exposing to high-energy radiation, baking, and developing in an organic solvent developer so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high dissolution contrast during organic solvent development and forms a fine hole or trench pattern of dimensional uniformity.

A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).

The invention relates to fatty acid acylated salicylate derivatives; compositions comprising an effective amount of a fatty acid acylated salicylate derivative; and methods for treating or preventing an inflammatory disorder comprising the administration of an effective amount of a fatty acid acylated salicylate derivative.

The present disclosure discloses a silicon-sulfur polymer, a solid electrolyte comprising the silicon-sulfur polymer, and a corresponding solid-state lithium-ion battery. The silicon-sulfur polymer of the present disclosure is a polymer compound comprising both an inorganic backbone-chain structure and an organic side-chain structure, and has the characteristics of both the organic polymer and the inorganic polymer as well as many unique properties. Therefore, the solid electrolyte formed by the silicon-sulfur polymer and the solid-state lithium-ion battery thereof have many good characteristics including a good lithium-ion-conduction capability, better thermal endurance, a wider range of operating temperatures, and better thermostability.

An electroluminescent display comprising semiconductor nanocrystals, wherein the semiconductor nanocrystals are selected to emit light at a predetermined wavelength and are disposed in a predetermined pattern. In certain embodiments, semiconductor nanocrystals that emit light at different predetermined wavelengths are disposed in the display to create a predetermined multi-color pattern.

A battery degradation determination device includes a fitting module configured to fit AC impedance measurement data into an equivalent circuit model including at least one circuit block in which a resistance and a constant phase element are connected in parallel, and to obtain circuit constants in the equivalent circuit model, a P-value saving module configured to save P values being index of the constant phase element obtained by fitting AC impedance measurement data of a reference battery to the equivalent circuit model, and a degradation determination module configured to perform degradation determination for a battery as a determination target based on circuit constants obtained by fitting AC impedance measurement data of the battery as a determination target to the equivalent circuit model with the use of the P values as fixed values, with reference to correlations between degrees of battery degradation and the circuit constants in the equivalent circuit model.

A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition.

Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;

A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive.

There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1):wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, andwherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic cation or a metal cation,

According to the embodiments, a pattern formation method includes a process of formation of a self-assembly material layer containing at least a first segment and a second segment on a substrate having a guide layer, a process of formation of a neutralization coating on the self-assembly material layer, and a process of formation of a self-assembly pattern including a first region containing the first segment and a second region containing the second segment following phase separation of the self-assembly material layer.

A pneumatic compression garment includes a flexible member for placement on a limb of a human body. A bladder in the flexible member defines an inflatable chamber. The bladder has an opening through which the inflatable chamber is inflated. A port mounted on the bladder has an air inlet adapted for communication with a source of pressurized air and an air outlet in communication with the inflatable chamber via the opening in the bladder. Pressurized air is delivered from into the inflatable chamber for inflating the inflatable chamber and thereby applying a compression force to the limb when the flexible member is in place on the limb. An air diverter affixed to an inside surface of a first sheet of the bladder and configured to divert air entering the inflatable chamber from directly impinging against an inside surface of a second sheet of the bladder.

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.

A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.

Improved fidelity to an integrated circuit pattern design in a semiconductor structure ultimately produced is achieved by modeling material removal and deposition processes in regard to materials, reactant, feature size, feature density, process parameters and the like as well as the effects of such parameters on etch and material deposition bias due to microloading and RIE lag (including inverse RIE lag) and using the models to work backward through the intended manufacturing method steps, including hard mask pattern decomposition, to morphologically develop feature patterns for use in most or all process steps which will result in the desired feature sizes and shapes at the completion of the overall process. Modeling of processes may be simplified through use of process assist features to locally adjust rates of material deposition and removal.

Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material may be formed by spin-casting a conformal layer of the first material across the features, or by selective deposition along the features relative to the substrate. After the first material is formed, fill material may be provided between the features while leaving regions of the first material exposed. The exposed regions of the first material may then be selectively removed relative to both the fill material and the features to create the pattern of openings.

The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and using a fluoropolymer to protect regions of said electronic or photonic material during a patterning process.

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.

An additive polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OR2)—R3 group (wherein R2 is H, acyl or acid labile group, R3 is H, CH3 or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes, a plurality of first assist features for restricting pattern distortion of the first dummy contact holes disposed inside a corresponding one of the first dummy contact holes, and an array of second assist features for additionally restricting pattern distortion of the first dummy contact holes. The array of second assist features is disposed outside of the first dummy contact holes. The method also includes forming an array of contact holes and first dummy contact holes on a wafer by using the photomask as an exposure mask.

Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

A harness attachment to shoulder strap harness for holding a guitar in the front of the player which is attached to the left fret end and right strumming end of the guitar. The present invention has an additional right srumming end attachment which mounts over the right strumming end attachment of the shoulder strap harness. The attachment of the present invention includes a lower mounting member and an upper adjustable loop member movably attachable to the player's right hip area in a number of embodiments.

This invention is applicable to bicycle non-circular chainrings or ovoid chainrings, attachable to a drive crank arm with a spider, forming a structure with anchorage points distributed in a star like shape; the said ovoid chainring (1) having a major diameter, whose angle with the said crank arm measured in the pedaling direction defines its orientation; whereas, said ovoid chainring has a number of anchorage points to said spider which is a multiple of the number of anchorage points of the spider, constituting multiple anchorage options to this crank arm, separated in such a distance that respective orientation values differ in 3°; and for such a small variation, the proposed constructive solution is equipping the ovoid chainring with consecutive overlapped holes and respective countersinks with different depth, forming stair steps which help supporting tangential loads to the chainring.

A radial tapping attachment for a motor-driven tool includes an enclosed, box-shaped housing, a main shaft assembly adapted to retain a tap, a drive mechanism rotatably driven by the tool and a guide member assembly for supporting an object to be tapped. The main shaft assembly includes a main shaft rotatably coupled to the housing by a pair of bearings, a pair of spaced apart discs fixedly mounted on the main shaft, and a pair of axially mounted compression springs that allow for slight, bi-directional, axial displacement of the main shaft relative to the housing. The drive mechanism includes a drive shaft rotatably coupled to the housing at an approximate right angle relative to the main shaft and a drive wheel mounted on the drive shaft that selectively engages the pair of discs to rotate the main shaft in either direction when an axial force is applied to the tap.

A dust collecting attachment that is mounted on a sander includes a suction portion mounted on a portion of a front housing where an output shaft projects, a flexible hose having a front end of the flexible hose connected to the suction portion, a discharge portion connected to a rear end of the flexible hose and a changeable member placed on both a motor housing and the discharge portion. The changeable member allows the discharge portion to be mounted at any position around an axis of the motor housing.

The invention relates to a process for producing ketones or hydrocarbon base oil from fatty acids preferably derived from a biological origin or other renewable source. The process is directed at making an aliphatic ketone or a mixture of aliphatic ketones having 14 to 52 carbon atoms, comprising a ketonization reaction of a fatty acid in a vapor phase with a decarboxylation-coupling catalyst to provide ketones, which can be deoxygenated to give saturated hydrocarbons, unsaturated hydrocarbons, and mixtures thereof. Base oils and transportation fuels may be produced from the process herein.

A pattern projector, comprising a light source, configured to emit a beam of light. A transparent substrate, which has a pair of mutually-opposed planar surfaces is configured to receive and propagate the beam within the substrate by total internal reflection between the planar surfaces. The transparent substrate comprises a diffractive structure that is formed on one of the planar surfaces and is configured to direct at least a part of the beam to propagate out of the substrate in a direction that is angled away from the surface and to create a pattern comprising multiple interleaved light and dark areas.

A device for capturing a three-dimensional object is presented, which allows, on one hand, a sufficiently large number of projected pixels and a high image quality of the projected pixels, and which has, on the other hand, a compact size and low assembly costs.

A sheet holder for holding a sheet of paper and exposing an edge of the sheet, has a press for holding the paper sheet and exposing the edge, and a lever for operating the press. The lever is movable between a released position for placing of the edge of the paper sheet in the press and a holding position for operating the press. There is also an abutment for abutment by the edge of the paper sheet to position the edge relative to the press while the lever is in the released position. The abutment is associated with the lever for moving away from the edge of the paper sheet when the lever moves towards the holding position, thereby exposing the edge of the paper sheet.

An improved orthotic has a strap that secures the orthotic to a wearer, and comprises a tension indicator coupled to the strap. The tension indicator includes a first element disposed to produce a tactile signal when a tension in the strap reaches a threshold that is less than a permanent deformation threshold.

The present invention provides a metal passivator/trap comprising a rare earth oxide dispersed on a matrix containing a calcined hydrous kaolin.

Oil compositions having a high concentration of polyunsaturated fatty acids are described for use in various applications including use as drying oils, in ink compositions and coating compositions. Oil compositions wherein the double bonds of the fatty acids are substantially epoxidized are described and used as plasticizers and thermal stabilizers for various halogenated polymer compositions.

A ball-detent torque-limiting assembly has breakout means for maintaining an axial separation distance between opposing pocketed surfaces of the assembly once the primary balls of the assembly have rolled out of their pockets, wherein the axial separation distance maintained by the breakout means is at least as great as the diameter of the balls. The breakout means may include a plurality of secondary balls deployed in a breakout event. The breakout means assumes the axially directed spring load that urges the opposing pocketed surfaces together, thereby preventing the primary balls from entering and exiting the pockets in quick and violent succession following breakout and avoiding damage to the torque-limiting assembly. The torque-limiting assembly is resettable by counter-rotation following a breakout event.

A torsional vibration damping device is configured to have hysteresis torques in the positive and negative sides varied by a simple construction, thereby improving the efficiency of production work and preventing an increase in production cost. Friction materials are respectively provided on surfaces of a hub member and the disc plates, the surfaces facing each other in the radial direction when the hub member is twisted in the positive side with respect to the disc plates. The friction materials are to be brought into friction contact with each other when the hub member is twisted by a specific angle with respect to the disc plates.

A system and method for a self-charging battery cell are provided in which beta emissions from a Strontium-90 source are obtained by a sensor device and converted into electric energy. In embodiments, a scintillation device is used to intake emissions from a Strontium-90 source, and consequently emit a light or plurality of light flashes. A sensor device, e.g., a photodiode, is utilized to convert the light or plurality of light flashes into electric voltage, current and/or energy.

The invention relates to multi-layer elastic thermoplastic films, which consist of at least one layer of thermoplastic polyurethane (TPE-U), at least one further layer of thermoplastic polyurethane which is blended with modified acrylonitrile-butadiene-styrene copolymer (MABS), and optionally at least one support layer of thermoplastic polymer which is incompatible with TPE-U, and to the use thereof.

A battery charging method for a hybrid vehicle and the hybrid vehicle using the same are disclosed. The hybrid vehicle includes an engine and a motor as power source and includes the battery in which electrical energy for driving the motor is stored. The method and system may include: determining whether the battery needs to be charged while the vehicle is stopped; transitioning a transmission to a neutral position (N position) when the battery needs to be charged; starting the engine and engaging an engine clutch to connect the engine with the motor so that the motor generates electrical energy via power from the engine. The electrical energy generated by the motor is then stored in the battery accordingly.

A battery charge/discharge control device which performs battery charge/discharge control in a working machine with a battery capable of storing electric energy generated by a generator motor coupled to an engine and driving the generator motor or at least one of other electric actuators by the stored electric energy and a controller which controls a distribution of the electric energy among the battery, the generator motor, and the electric actuator, wherein the controller performs the charge/discharge control in which the electric energy of the battery is discharged when the engine is driven and recharging to the battery is permitted on a condition that a state in which an engine speed is equal to or lower than a predetermined engine speed is maintained for a predetermined time after the battery is completely discharged.

A spreader (100) has a hopper or bin (1) for storing a spreadable material (2), a plurality of spinners (5, 6) adapted to receive the material from the hopper or bin and to spread the material (2) on the ground, and a Global Positioning System (GPS) receiver (8) for sensing the position of the spreader (100) and providing an output signal indicative of a position of the spreader to a controller (7). The controller (7) calculates a required pattern and density of material (2) to be spread by the spinners (5, 6) based on a comparison of the actual position of the spreader (A) to a preferred position of the spreader (I), and controls the spinners (5, 6) in order to obtain the required pattern and density of spread material (2). A method of controlling the pattern and density of material spread by a spreader is also disclosed.

A connecting structure for a secondary battery for electrically connecting a core pack where two or more unit cells are electrically connected and a protection circuit module made of the unit cells of the core pack and a PCB substrate. The connecting structure includes a metal plate having an electrode connecting unit connected to an electrode of each unit cell of the core pack and a circuit connecting unit connected to the protection circuit module; and a circuit terminal unit electrically connected to the circuit connecting unit by being located in a connection hole formed in the PCB substrate of the protection circuit module so that the upper and lower portions of the PCB substrate communicate with each other. The circuit connecting unit is coupled and electrically connected to the circuit terminal unit by means of a connection method which allows selective connection and separation.